Dual morphology of islands and fractal holes in block copolymer thin films [2]

S. H. Lee; H. Kang; J. Cho; Sang Kim Youn Sang Kim; K. Char

doi:10.1021/ma010899k

Dual morphology of islands and fractal holes in block copolymer thin films [2]

S. H. Lee, H. Kang, J. Cho, Sang Kim Youn Sang Kim, K. Char

Research output: Contribution to journal › Letter › peer-review

14 Citations (Scopus)

Abstract

The dual morphology of islands and fractal holes in block copolymer thin films was reported. The development of fractal holes in the films was attributed to lateral strains induced by post evaporation of small amounts of residual high-boiling solvent after fast formation of parallel lamellae with interconnected islands. The thin films so created are suitable to be used as nonglossy coating materials due to their self-similar micropatterns.

Original language	English
Pages (from-to)	8405-8408
Number of pages	4
Journal	Macromolecules
Volume	34
Issue number	24
DOIs	https://doi.org/10.1021/ma010899k
Publication status	Published - 2001 Nov 20
Externally published	Yes

ASJC Scopus subject areas

Organic Chemistry
Polymers and Plastics
Inorganic Chemistry
Materials Chemistry

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abstract = "The dual morphology of islands and fractal holes in block copolymer thin films was reported. The development of fractal holes in the films was attributed to lateral strains induced by post evaporation of small amounts of residual high-boiling solvent after fast formation of parallel lamellae with interconnected islands. The thin films so created are suitable to be used as nonglossy coating materials due to their self-similar micropatterns.",

author = "Lee, {S. H.} and H. Kang and J. Cho and {Youn Sang Kim}, {Sang Kim} and K. Char",

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AU - Lee, S. H.

AU - Kang, H.

AU - Cho, J.

AU - Youn Sang Kim, Sang Kim

AU - Char, K.

PY - 2001/11/20

Y1 - 2001/11/20

N2 - The dual morphology of islands and fractal holes in block copolymer thin films was reported. The development of fractal holes in the films was attributed to lateral strains induced by post evaporation of small amounts of residual high-boiling solvent after fast formation of parallel lamellae with interconnected islands. The thin films so created are suitable to be used as nonglossy coating materials due to their self-similar micropatterns.

AB - The dual morphology of islands and fractal holes in block copolymer thin films was reported. The development of fractal holes in the films was attributed to lateral strains induced by post evaporation of small amounts of residual high-boiling solvent after fast formation of parallel lamellae with interconnected islands. The thin films so created are suitable to be used as nonglossy coating materials due to their self-similar micropatterns.

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