Abstract
The dual morphology of islands and fractal holes in block copolymer thin films was reported. The development of fractal holes in the films was attributed to lateral strains induced by post evaporation of small amounts of residual high-boiling solvent after fast formation of parallel lamellae with interconnected islands. The thin films so created are suitable to be used as nonglossy coating materials due to their self-similar micropatterns.
| Original language | English |
|---|---|
| Pages (from-to) | 8405-8408 |
| Number of pages | 4 |
| Journal | Macromolecules |
| Volume | 34 |
| Issue number | 24 |
| DOIs | |
| Publication status | Published - 2001 Nov 20 |
ASJC Scopus subject areas
- Organic Chemistry
- Polymers and Plastics
- Inorganic Chemistry
- Materials Chemistry
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Lee, S. H., Kang, H., Cho, J., Youn Sang Kim, S. K., & Char, K. (2001). Dual morphology of islands and fractal holes in block copolymer thin films [2]. Macromolecules, 34(24), 8405-8408. https://doi.org/10.1021/ma010899k