Dynamic Change in Color Filter Layers during the Baking Process by Multi-Speckle Diffusing Wave Spectroscopy

Baek Sung Park, Kyung Hee Hyung, Gwi Jeong Oh, Hyun Wook Jung

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Undercut defects of color filter (CF) layers, which inevitably occur in UV curing and development processes for liquid crystal displays and white organic light-emitting diodes, should be elucidated to ensure product quality and processability. The dynamic changes of the green CF layer are investigated during the baking process by examining the motion of pigment particles within the thin CF layer via multi-speckle diffusing wave spectroscopy (MSDWS). Autocorrelation functions and characteristic times for the α-relaxation, which are determined using light intensities scattered from the CF layer, directly indicate thermal melting and curing stages in the process. It is confirmed that MSDWS is a reliable non-contact measurement tool for quantitatively analyzing the initial change of the CF layer during the baking process.

Original languageEnglish
Pages (from-to)2230-2238
Number of pages9
JournalChemical Engineering and Technology
Volume40
Issue number12
DOIs
Publication statusPublished - 2017 Dec 1

Keywords

  • Autocorrelation function
  • Characteristic relaxation time
  • Color filter
  • Multi-speckle diffusing wave spectroscopy
  • Particle dynamics

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Industrial and Manufacturing Engineering

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