Effect of a Mo interlayer on the electrical and structural properties of nickel silicides

Young W. Ok, Chel Jong Choi, Tae Yeon Seong

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

The effect of a Mo interlayer on the electrical properties and thermal stability of nickel silicides was investigated. It is shown that the samples with the interlayer produced lower sheet resistances than did the samples without the interlayer, for annealing temperatures in the range 400-800°C. Glancing angle X-ray diffraction results show that NiSi is transformed into NiSi2 at temperatures in excess of 700°C, at which a tetragonal MoSi2 phase is also formed. It is also shown that the Mo layer moves toward the surface region, when annealed at temperatures in excess of 500°C. Transmission electron microscopy and scanning electron microscopy results show that the insertion of the interlayer was effective in improving the surface morphology of the silicide films and the uniformity of the silicide/Si interface.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume150
Issue number7
DOIs
Publication statusPublished - 2003 Jul 1
Externally publishedYes

Fingerprint

Silicides
silicides
Nickel
Structural properties
interlayers
Electric properties
electrical properties
nickel
Sheet resistance
Temperature
Surface morphology
Thermodynamic stability
Annealing
Transmission electron microscopy
temperature
insertion
X ray diffraction
Scanning electron microscopy
thermal stability
transmission electron microscopy

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Effect of a Mo interlayer on the electrical and structural properties of nickel silicides. / Ok, Young W.; Choi, Chel Jong; Seong, Tae Yeon.

In: Journal of the Electrochemical Society, Vol. 150, No. 7, 01.07.2003.

Research output: Contribution to journalArticle

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