Effect of CMP on the Te segregation in Ge ₂Sb ₂Te ₅ films

Engineering & Materials Science

• Chemical mechanical polishing 100%
• Surface properties 45%
• Phase transitions 31%
• Surface roughness 25%
• Chalcogenides 24%
• Electron microscopy 19%
• Thermal effects 15%
• X ray diffraction 15%
• Thin films 14%
• Data storage equipment 9%

Physics & Astronomy

• polishing 80%
• platens 69%
• phase transformations 27%
• surface roughness 25%
• surface properties 15%
• chalcogenides 15%
• temperature effects 13%
• electron microscopy 13%
• causes 9%
• diffraction 8%
• thin films 7%
• x rays 6%

Chemical Compounds

• Polishing 88%
• Surface Roughness 38%
• Liquid Film 37%
• Auger Electron Microscopy 35%
• Pressure 33%
• Surface 24%
• X-Ray Diffraction 9%
• Amount 8%