Effect of deposition temperature and thermal annealing on the dry etch rate of a-C: H films for the dry etch hard process of semiconductor devices

Seung Moo Lee, Jaihyung Won, Soyoung Yim, Se Jun Park, Jongsik Choi, Jeongtae Kim, Hyeondeok Lee, Dongjin Byun

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

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