Effect of fluorine doping on the properties of ZnO films deposited by radio frequency magnetron sputtering

D. Y. Ku, Y. H. Kim, K. S. Lee, T. S. Lee, B. Cheong, Tae Yeon Seong, W. M. Kim

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

ZnO films with varying fluorine content were prepared on Corning glass by radio frequency magnetron sputtering of ZnO target containing ZnF2 at room temperature, and the compositional, electrical, optical, and structural properties of the as-grown films together with the vacuum-annealed films were investigated. The fluorine content in the fluorine doped ZnO (FZO) films increased almost linearly with increasing ZnF2 content in sputter target, and the highest atomic concentration was 7.3%. Vacuum-annealing caused a slight reduction of fluorine content in the films. The resistivity of the as-grown FZO films deposited showed a typical valley-like behavior with respect to the fluorine content in film, i.e. having minimum resistivity at intermediate fluorine content. Despite high fluorine content in the FZO films, the carrier concentration remained below 1.2×1020 cm-3, leading to very low doping efficiency level. Upon vacuum-annealing, the resistivity of FZO films decreased substantially due to increase in both the carrier concentration and the Hall mobility. From the structural analysis made by X-ray diffraction study, it was shown that addition of small amount of fluorine enhanced the crystallinity of FZO films with (002) preferred orientation, and that large amount of fluorine addition yielded disruption of preferred orientation. It was also shown that doping of fluorine rendered a beneficial effect in reducing the absorption loss of ZnO films in visible range, thereby substantially enhancing the figure of merit.

Original languageEnglish
Pages (from-to)415-421
Number of pages7
JournalJournal of Electroceramics
Volume23
Issue number2-4
DOIs
Publication statusPublished - 2009 Oct 1

Fingerprint

Fluorine
Magnetron sputtering
fluorine
radio frequencies
magnetron sputtering
Doping (additives)
Vacuum
vacuum
electrical resistivity
Carrier concentration
Annealing
Hall mobility
annealing
structural analysis
Structural analysis
figure of merit
valleys
Structural properties
crystallinity

Keywords

  • Fluorine doped ZnO film
  • Magnetron sputtering
  • Transparent conducting oxide
  • Vacuum-annealing

ASJC Scopus subject areas

  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Mechanics of Materials

Cite this

Effect of fluorine doping on the properties of ZnO films deposited by radio frequency magnetron sputtering. / Ku, D. Y.; Kim, Y. H.; Lee, K. S.; Lee, T. S.; Cheong, B.; Seong, Tae Yeon; Kim, W. M.

In: Journal of Electroceramics, Vol. 23, No. 2-4, 01.10.2009, p. 415-421.

Research output: Contribution to journalArticle

Ku, D. Y. ; Kim, Y. H. ; Lee, K. S. ; Lee, T. S. ; Cheong, B. ; Seong, Tae Yeon ; Kim, W. M. / Effect of fluorine doping on the properties of ZnO films deposited by radio frequency magnetron sputtering. In: Journal of Electroceramics. 2009 ; Vol. 23, No. 2-4. pp. 415-421.
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