TY - JOUR
T1 - Effect of H 2 sputter gas on interfacial mixing in spin valves
AU - Ahn, Whang Gi
AU - Lee, Seong Rae
PY - 2005/5/15
Y1 - 2005/5/15
N2 - We introduced the use of hydrogen during the deposition of spin valves to achieve better control of interfacial mixing, especially for bottom spin valves (B-SV). The hydrogen was introduced during deposition of the CoFe or IrMn layer depending on whether it was a B-SV or a top spin valve (T-SV). The magnetoresistance ratio and Hex increased to 15% and 30%, respectively, when hydrogen (10 vol %) was introduced for a B-SV. By contrast, the hydrogen effect for a T-SV was small. Using hydrogen (10 vol %), the surface of the SV was smoother (1.01 nm) than without hydrogen (1.94 nm). In addition, the SV with hydrogen had a well-developed (111) texture and larger grains. By introducing hydrogen, we could control the microstructure and reduce the intermixing between CoFe and IrMn, especially for B-SVs.
AB - We introduced the use of hydrogen during the deposition of spin valves to achieve better control of interfacial mixing, especially for bottom spin valves (B-SV). The hydrogen was introduced during deposition of the CoFe or IrMn layer depending on whether it was a B-SV or a top spin valve (T-SV). The magnetoresistance ratio and Hex increased to 15% and 30%, respectively, when hydrogen (10 vol %) was introduced for a B-SV. By contrast, the hydrogen effect for a T-SV was small. Using hydrogen (10 vol %), the surface of the SV was smoother (1.01 nm) than without hydrogen (1.94 nm). In addition, the SV with hydrogen had a well-developed (111) texture and larger grains. By introducing hydrogen, we could control the microstructure and reduce the intermixing between CoFe and IrMn, especially for B-SVs.
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U2 - 10.1063/1.1853876
DO - 10.1063/1.1853876
M3 - Article
AN - SCOPUS:20944437730
VL - 97
JO - Journal of Applied Physics
JF - Journal of Applied Physics
SN - 0021-8979
IS - 10
M1 - 10N707
ER -