Effect of inductively coupled plasma on the structural and electrical properties of Ti-doped ITO films formed by IPVD

Chan Hwa Hong, Jae Heon Shin, Nae Man Park, Kyung Hyun Kim, Bo Sul Kim, Chang Woo Song, Ji Woong Yang, Woo Hyung Seo, Byeong Kwon Ju, Woo Seok Cheong

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