Effect of oxidizable electrode material on resistive switching characteristics of ZnOxsS1-x films

Kyoungah Cho, Sukhyung Park, Isaac Chung, Sangsig Kim

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

We investigate the memory characteristics of ZnOxS1-x based resistive switching random access memory (ReRAM) devices with Al and Pt bottom electrodes (BEs). Both the ReRAM devices with Al and Pt BEs exhibit unipolar resistive switching behaviors, regardless of the materials of the BEs. The ratios of the high resistance state (HRS) to the low resistance state (LRS) of the Au/annealed ZnOxS1-x/Al and the Au/annealed ZnOxS1-x/Pt devices are more than 106 and 104, respectively. The HRS depends more significantly on the material of the BE than the LRS. The resistance in the HRS of the device with the Al BE is more stable in the endurance characteristics and higher in magnitude than that of the device with the Pt BE. For an anealed ZnOxS1-x/Al film, the oxygen signal in the auger depth profile shows the formation of an AlOx layer at the interface between the annealed ZnOxS1-x layer and the Al BE. The difference between the memory characteristics of the annealed ZnOxS1-x devices with the Al and Pt BEs is explained with the presence or absence of the oxidized layers formed in the interfaces between the annealed ZnOxS1-x films and the BEs.

Original languageEnglish
Pages (from-to)8187-8190
Number of pages4
JournalJournal of Nanoscience and Nanotechnology
Volume14
Issue number11
DOIs
Publication statusPublished - 2014 Nov 1

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electrode materials
Electrodes
electrodes
Equipment and Supplies
high resistance
Data storage equipment
random access memory
low resistance
endurance
Durability
Oxygen
oxygen
profiles

Keywords

  • Oxidizable electrode
  • Resistive switching memory
  • ZnOS

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Chemistry(all)
  • Materials Science(all)
  • Bioengineering
  • Biomedical Engineering

Cite this

Effect of oxidizable electrode material on resistive switching characteristics of ZnOxsS1-x films. / Cho, Kyoungah; Park, Sukhyung; Chung, Isaac; Kim, Sangsig.

In: Journal of Nanoscience and Nanotechnology, Vol. 14, No. 11, 01.11.2014, p. 8187-8190.

Research output: Contribution to journalArticle

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