Effect of photopolymerization on the rate of photocrosslink in chalcone-based oligomeric compounds

Dong Hoon Choi, Sang Joon Oh, Si Young Ban, Kwang Yong Oh

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

A new photochemically bifunctional epoxy and dimethacrylate compounds were synthesized for investigating the photosensitivity under UV irradiation. Photosensitivity of the synthesized chalcone-based compounds was investigated by using UV-visible absorption and Fourier transformed infrared (FT-IR) spectroscopies. The result of spectroscopic analysis substantiated that the two chalcone-based compounds have functions of both photocrosslinking and photopolymerization by UV exposure in the presence of photoinitiator. Two kinds of photochemical reactions proceeded competitively during UV exposure. Particularly, we studied the effect of photopolymerization on the rate of photocrosslink due to cycloaddition in the two oligomeric compounds.

Original languageEnglish
Pages (from-to)1207-1212
Number of pages6
JournalBulletin of the Korean Chemical Society
Volume22
Issue number11
Publication statusPublished - 2001 Nov 20

Keywords

  • Chalcone-dimethacrylate
  • Chalcone-epoxy
  • Photocrosslink
  • Photopolymerization
  • Photosensitivity

ASJC Scopus subject areas

  • Chemistry(all)

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