Effect of the Mo back contact microstructure on the preferred orientation of CIGS thin films

Ju Heon Yoon, Kwan Hee Yoon, Jong Keun Kim, Won Mok Kim, Jong Keuk Park, Taek Sung Lee, Young Joon Baik, Tae Yeon Seong, Jeung Hyun Jeong

Research output: Chapter in Book/Report/Conference proceedingConference contribution

21 Citations (Scopus)

Abstract

The effect of varying microstructures of Mo films on CIGS preferred orientation has been studied by changing Mo working pressure (in sputtering). CIGS I(220)/I(112) and IGS I(300)/I(006) have strong dependencies of the residual stress of Mo closely related to its microstructures: they increases with Mo pressure and then gradually decreases with Mo pressure, as the residual stress does. The trend is exactly opposite to the known effect due to Na. Thus this work shows that Mo microstructure itself can determine IGS and CIGS textures without assistance of other factors such as Na. XRD analysis on selenized Mo and TEM work on IGS/Mo show that MoSe 2 reactivity itself influences the IGS texture more than its orientation. In addition, MoSe 2 reactivity depends on the in-grain density of Mo which is linearly related to the residual stress.

Original languageEnglish
Title of host publicationConference Record of the IEEE Photovoltaic Specialists Conference
Pages2443-2447
Number of pages5
DOIs
Publication statusPublished - 2010 Dec 20
Event35th IEEE Photovoltaic Specialists Conference, PVSC 2010 - Honolulu, HI, United States
Duration: 2010 Jun 202010 Jun 25

Other

Other35th IEEE Photovoltaic Specialists Conference, PVSC 2010
CountryUnited States
CityHonolulu, HI
Period10/6/2010/6/25

Fingerprint

Residual stresses
Thin films
Microstructure
Textures
Sputtering
Transmission electron microscopy

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Control and Systems Engineering
  • Industrial and Manufacturing Engineering

Cite this

Yoon, J. H., Yoon, K. H., Kim, J. K., Kim, W. M., Park, J. K., Lee, T. S., ... Jeong, J. H. (2010). Effect of the Mo back contact microstructure on the preferred orientation of CIGS thin films. In Conference Record of the IEEE Photovoltaic Specialists Conference (pp. 2443-2447). [5614175] https://doi.org/10.1109/PVSC.2010.5614175

Effect of the Mo back contact microstructure on the preferred orientation of CIGS thin films. / Yoon, Ju Heon; Yoon, Kwan Hee; Kim, Jong Keun; Kim, Won Mok; Park, Jong Keuk; Lee, Taek Sung; Baik, Young Joon; Seong, Tae Yeon; Jeong, Jeung Hyun.

Conference Record of the IEEE Photovoltaic Specialists Conference. 2010. p. 2443-2447 5614175.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Yoon, JH, Yoon, KH, Kim, JK, Kim, WM, Park, JK, Lee, TS, Baik, YJ, Seong, TY & Jeong, JH 2010, Effect of the Mo back contact microstructure on the preferred orientation of CIGS thin films. in Conference Record of the IEEE Photovoltaic Specialists Conference., 5614175, pp. 2443-2447, 35th IEEE Photovoltaic Specialists Conference, PVSC 2010, Honolulu, HI, United States, 10/6/20. https://doi.org/10.1109/PVSC.2010.5614175
Yoon JH, Yoon KH, Kim JK, Kim WM, Park JK, Lee TS et al. Effect of the Mo back contact microstructure on the preferred orientation of CIGS thin films. In Conference Record of the IEEE Photovoltaic Specialists Conference. 2010. p. 2443-2447. 5614175 https://doi.org/10.1109/PVSC.2010.5614175
Yoon, Ju Heon ; Yoon, Kwan Hee ; Kim, Jong Keun ; Kim, Won Mok ; Park, Jong Keuk ; Lee, Taek Sung ; Baik, Young Joon ; Seong, Tae Yeon ; Jeong, Jeung Hyun. / Effect of the Mo back contact microstructure on the preferred orientation of CIGS thin films. Conference Record of the IEEE Photovoltaic Specialists Conference. 2010. pp. 2443-2447
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