Effect of the plasma treatment of anode electrode of the organic light-emitting diodes on the growth of hole-injection layer

Young Wook Park, Jong Hoon Jang, Young Min Kim, Jin Hwan Choi, Tae Hyun Park, Jinnil Choi, Byeong Kwon Ju

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

In this paper, we focused on the effects of the plasma treatment of the anode electrode of organic light emitting diodes (OLED) on the growth of hole-injection layer (HIL). The CF4 plasma (CF4-P) treatment, which is known for efficient method to enhance the performance of OLED, was not effective on the OLED with the HIL material copper phthalocyanine (CuPc). The CF4-P treated OLED showed remarkably reduced electroluminescence (EL) characteristics while the O2 plasma treated OLED showed improved EL efficiency. The dependence of the CuPc growth on the polarity of substrate induced the morphological difference of the HIL, and finally resulted in the different device characteristics.

Original languageEnglish
Pages (from-to)4108-4110
Number of pages3
JournalThin Solid Films
Volume517
Issue number14
DOIs
Publication statusPublished - 2009 May 29

Keywords

  • Copper phthalocyanine
  • Hole-injection layer
  • Morphology
  • Organic light-emitting diodes
  • Surface polarity

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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