Effect of UV-assisted RTA on the electrical properties of (Ba,Sr) TiO3 films for low temperature embedding of decoupling capacitor

Kwang Hwan Cho, Min G. Kang, Chong-Yun Kang, Seok J. Yoon, Youngpak Lee, Jong H. Kim, Bong H. Cho

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Polycrystalline Ba0.4 Sr0.6 TiO3 (BST) thin films grown at 350°C with UV-assisted rapidly thermal annealing (RTA) showed a high- k value of 183 at 100 kHz. The 100 nm thick BST film with UV-assisted RTA exhibited a high capacitance density of 16.2 fF/μ m 2 and a low dissipation factor of 0.48% at 100 kHz with a low leakage current density of 1× 10-8 A/ cm2 at 0.5 MV/cm. The quadratic and linear voltage coefficients of capacitances of the BST film with UV-assisted RTA were -155 ppm/ V2 and 231 ppm/V, respectively. All these make the BST decoupling capacitor very suitable for use in radio-frequency circuits and mixed-signal integrated circuits.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume156
Issue number12
DOIs
Publication statusPublished - 2009 Nov 10

Fingerprint

decoupling
embedding
capacitors
Electric properties
Capacitors
electrical properties
Annealing
annealing
Capacitance
capacitance
Leakage currents
Temperature
integrated circuits
radio frequencies
leakage
Current density
dissipation
current density
Thin films
Networks (circuits)

ASJC Scopus subject areas

  • Electrochemistry
  • Renewable Energy, Sustainability and the Environment
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

Cite this

Effect of UV-assisted RTA on the electrical properties of (Ba,Sr) TiO3 films for low temperature embedding of decoupling capacitor. / Cho, Kwang Hwan; Kang, Min G.; Kang, Chong-Yun; Yoon, Seok J.; Lee, Youngpak; Kim, Jong H.; Cho, Bong H.

In: Journal of the Electrochemical Society, Vol. 156, No. 12, 10.11.2009.

Research output: Contribution to journalArticle

Cho, Kwang Hwan ; Kang, Min G. ; Kang, Chong-Yun ; Yoon, Seok J. ; Lee, Youngpak ; Kim, Jong H. ; Cho, Bong H. / Effect of UV-assisted RTA on the electrical properties of (Ba,Sr) TiO3 films for low temperature embedding of decoupling capacitor. In: Journal of the Electrochemical Society. 2009 ; Vol. 156, No. 12.
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AU - Cho, Kwang Hwan

AU - Kang, Min G.

AU - Kang, Chong-Yun

AU - Yoon, Seok J.

AU - Lee, Youngpak

AU - Kim, Jong H.

AU - Cho, Bong H.

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AB - Polycrystalline Ba0.4 Sr0.6 TiO3 (BST) thin films grown at 350°C with UV-assisted rapidly thermal annealing (RTA) showed a high- k value of 183 at 100 kHz. The 100 nm thick BST film with UV-assisted RTA exhibited a high capacitance density of 16.2 fF/μ m 2 and a low dissipation factor of 0.48% at 100 kHz with a low leakage current density of 1× 10-8 A/ cm2 at 0.5 MV/cm. The quadratic and linear voltage coefficients of capacitances of the BST film with UV-assisted RTA were -155 ppm/ V2 and 231 ppm/V, respectively. All these make the BST decoupling capacitor very suitable for use in radio-frequency circuits and mixed-signal integrated circuits.

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