Effective light absorptive layer-using mezo-porous silicon by electrochemical etching

Jae Hong Kwon, Soo Hong Lee, Byeong Kwon Ju

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Porous silicon (PS), an excellent light diffuser, can be used as an antireflective layer that does not need to be coated with other antireflection coating (ARC) materials. PS layers were obtained by electrochemical etching (ECE) anodization of silicon wafers in hydrofluoric acid/ethanol/deionized (DI) water solution (HF/EtOH/H2O). This technique selectively removes Si atoms from the sample surface, forming a PS layer with adjustable optical, electrical, and mechanical properties. A PS layer with optimal antireflection characteristics was obtained for a charge density (Q) of 5.2C/cm2. The weighted reflectance was reduced from 24 to 4% in the wavelength range from 400 to 1000nm. The weighted reflectance with optimized PS layers is much less than that with a commercial SiNx ARC on a potassium hydroxide (KOH) pretextured multicrystalline silicon (mc-Si) surface. Therefore, it can be successfully used as an alternative way for the preparation of a PS antireflective layer for a silicon solar cell.

Original languageEnglish
Pages (from-to)2875-2880
Number of pages6
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume45
Issue number4 A
DOIs
Publication statusPublished - 2006 Apr 7

Fingerprint

Electrochemical etching
Porous silicon
porous silicon
etching
Antireflection coatings
antireflection coatings
reflectance
potassium hydroxides
Potassium hydroxide
Hydrofluoric acid
Deionized water
diffusers
Silicon solar cells
hydrofluoric acid
silicon
Charge density
Silicon wafers
Electric properties
Ethanol
ethyl alcohol

Keywords

  • Antireflective layer
  • Electrochemical etching
  • Porous silicon
  • Solar cell

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Effective light absorptive layer-using mezo-porous silicon by electrochemical etching. / Kwon, Jae Hong; Lee, Soo Hong; Ju, Byeong Kwon.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 45, No. 4 A, 07.04.2006, p. 2875-2880.

Research output: Contribution to journalArticle

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