Effects of atomic layer deposition conditions on the formation of thin ZnO films and their photocatalytic characteristics

Kang Hee Park, Gwon Deok Han, Beom Joon Kim, Eun Heui Kang, Jong Seon Park, Joon Hyung Shim, Hee-Deung Park

Research output: Contribution to journalArticle

Abstract

The use of photocatalysts in water treatment systems is regarded as an advanced technology. To ensure efficiency and stability, the optimization of photocatalyst immobilization is essential for application in water treatment processes. In this study, we investigated the effect of atomic layer deposition (ALD) conditions on the development of highly photocatalytically active thin ZnO films. Three different temperatures and three ALD cycles were employed to evaluate the photocatalytic activity of thin ZnO films (represented by the production rate of reactive oxygen species and the degradation rate of methylene blue). We found that the surface properties of the thin ZnO films, such as grain size and homogeneity, exerted a dominant influence on the photocatalytic activity. At a low temperature (50 °C), nanograins were not formed properly, while various nanograin shapes were obtained at a high temperature (250 °C). The optimized grain had a grain size of 20 nm and a (002)/(101) crystalline orientation ratio of 2.2. The UV light absorption increased in proportion to the film thickness, and a minimum film thickness (50 nm) was necessary to ensure high photocatalytic activity at the film surface. In addition, the increase in the photocatalytic activity was not significant as the thickness increased beyond the optimum thickness. These results will provide useful guidelines for the fabrication of thin ZnO films with excellent photocatalytic activity for water treatment.

Original languageEnglish
JournalCeramics International
DOIs
Publication statusPublished - 2019 Jan 1

Fingerprint

Atomic layer deposition
Water treatment
Thin films
Photocatalysts
Film thickness
Methylene Blue
Ultraviolet radiation
Crystal orientation
Temperature
Surface properties
Reactive Oxygen Species
Crystalline materials
Fabrication
Degradation
Oxygen

Keywords

  • Atomic layer deposition
  • Photocatalyst
  • Photocatalytic degradation
  • Reactive oxygen species
  • Zinc oxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Effects of atomic layer deposition conditions on the formation of thin ZnO films and their photocatalytic characteristics. / Park, Kang Hee; Han, Gwon Deok; Kim, Beom Joon; Kang, Eun Heui; Park, Jong Seon; Shim, Joon Hyung; Park, Hee-Deung.

In: Ceramics International, 01.01.2019.

Research output: Contribution to journalArticle

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