Effects of Br and Cl on organometallic vapor phase epitaxial growth and ordering in GaInP

A. D. Howard, L. W. Rieth, D. C. Chapman, R. R. Wixom, G. B. Stringfellow, B. J. Kim, Tae Yeon Seong

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The effects of addition of CCl 4 and CBr 4 during organometallic vapor phase epitaxy (OMPVE) of GaInO were investigated. The addition of Br in small concentrations decreased the amount of CuPt ordering via transmission electron diffraction and photoluminescence measurements. Both Cl and Br significantly roughen the surface morphology. The results from atomic force microscopy show that facets formed increased in height and angle to (001) growth surface with increase in surfactant concentration.

Original languageEnglish
Pages (from-to)2319-2323
Number of pages5
JournalJournal of Applied Physics
Volume95
Issue number5
DOIs
Publication statusPublished - 2004 Mar 1
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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  • Cite this

    Howard, A. D., Rieth, L. W., Chapman, D. C., Wixom, R. R., Stringfellow, G. B., Kim, B. J., & Seong, T. Y. (2004). Effects of Br and Cl on organometallic vapor phase epitaxial growth and ordering in GaInP. Journal of Applied Physics, 95(5), 2319-2323. https://doi.org/10.1063/1.1643783