Effects of Br and Cl on organometallic vapor phase epitaxial growth and ordering in GaInP

A. D. Howard, L. W. Rieth, D. C. Chapman, R. R. Wixom, G. B. Stringfellow, B. J. Kim, Tae Yeon Seong

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The effects of addition of CCl 4 and CBr 4 during organometallic vapor phase epitaxy (OMPVE) of GaInO were investigated. The addition of Br in small concentrations decreased the amount of CuPt ordering via transmission electron diffraction and photoluminescence measurements. Both Cl and Br significantly roughen the surface morphology. The results from atomic force microscopy show that facets formed increased in height and angle to (001) growth surface with increase in surfactant concentration.

Original languageEnglish
Pages (from-to)2319-2323
Number of pages5
JournalJournal of Applied Physics
Volume95
Issue number5
DOIs
Publication statusPublished - 2004 Mar 1
Externally publishedYes

Fingerprint

vapor phases
vapor phase epitaxy
flat surfaces
electron diffraction
surfactants
atomic force microscopy
photoluminescence

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Howard, A. D., Rieth, L. W., Chapman, D. C., Wixom, R. R., Stringfellow, G. B., Kim, B. J., & Seong, T. Y. (2004). Effects of Br and Cl on organometallic vapor phase epitaxial growth and ordering in GaInP. Journal of Applied Physics, 95(5), 2319-2323. https://doi.org/10.1063/1.1643783

Effects of Br and Cl on organometallic vapor phase epitaxial growth and ordering in GaInP. / Howard, A. D.; Rieth, L. W.; Chapman, D. C.; Wixom, R. R.; Stringfellow, G. B.; Kim, B. J.; Seong, Tae Yeon.

In: Journal of Applied Physics, Vol. 95, No. 5, 01.03.2004, p. 2319-2323.

Research output: Contribution to journalArticle

Howard, AD, Rieth, LW, Chapman, DC, Wixom, RR, Stringfellow, GB, Kim, BJ & Seong, TY 2004, 'Effects of Br and Cl on organometallic vapor phase epitaxial growth and ordering in GaInP', Journal of Applied Physics, vol. 95, no. 5, pp. 2319-2323. https://doi.org/10.1063/1.1643783
Howard AD, Rieth LW, Chapman DC, Wixom RR, Stringfellow GB, Kim BJ et al. Effects of Br and Cl on organometallic vapor phase epitaxial growth and ordering in GaInP. Journal of Applied Physics. 2004 Mar 1;95(5):2319-2323. https://doi.org/10.1063/1.1643783
Howard, A. D. ; Rieth, L. W. ; Chapman, D. C. ; Wixom, R. R. ; Stringfellow, G. B. ; Kim, B. J. ; Seong, Tae Yeon. / Effects of Br and Cl on organometallic vapor phase epitaxial growth and ordering in GaInP. In: Journal of Applied Physics. 2004 ; Vol. 95, No. 5. pp. 2319-2323.
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