Abstract
We investigated various characteristics of chlorinated indium tin oxide (Cl-ITO)for highly efficient organic light-emitting diodes (OLEDs): the work function, surface morphology, wetting characteristic, and hole-injection property. Via the systematic analysis of Cl-ITO, we showed that the modification of ITO using the plasma treatment method has a simple process and offers higher stability than that achieved with a solution-based modification method. We fabricated Cl-ITO with a high work function of 6.04 eV, which is 1.04 eV higher than that of pristine ITO. We verified that Cl 2 plasma treatment does not affect the ITO surface morphology. The Cl halogenated surface showed a low surface polarity and influenced the growth of the organic material, especially for films as thin as ∼4 nm. Therefore, we found when using ultra-thin film on Cl-ITO for design devices, the wetting characteristic of Cl-ITO should be considered. In addition, using tris-(4-carbazoyl-9-ylphenyl)-amine resulted in increased current and power efficiencies compared with those obtained using 4,4′-N,N′-dicarbazolebiphenyl. When a carrier-only device was used, the carrier-injection characteristics of Cl-ITO were higher than those of other well-known hole-injection materials. Furthermore, the Cl-ITO OLEDs showed higher stability than OLEDs with other hole-injection materials.
| Original language | English |
|---|---|
| Pages (from-to) | 51-57 |
| Number of pages | 7 |
| Journal | Optical Materials |
| Volume | 93 |
| DOIs | |
| Publication status | Published - 2019 Jul 1 |
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Keywords
- Cl plasma treatment
- Indium tin oxide (ITO)
- Organic light-emitting diodes (OLEDs)
- Stability
- Wettability
- Work function
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Computer Science(all)
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering
Cite this
Effects of Cl 2 plasma treatment on stability, wettability, and electrical properties of ITO for OLEDs . / Jung, Sun Gyu; Choi, Kyung Bok; Park, Chan Hyuk; Shim, Yong Sub; Park, Cheol Hwee; Park, Young Wook; Ju, Byeong Kwon.
In: Optical Materials, Vol. 93, 01.07.2019, p. 51-57.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Effects of Cl 2 plasma treatment on stability, wettability, and electrical properties of ITO for OLEDs
AU - Jung, Sun Gyu
AU - Choi, Kyung Bok
AU - Park, Chan Hyuk
AU - Shim, Yong Sub
AU - Park, Cheol Hwee
AU - Park, Young Wook
AU - Ju, Byeong Kwon
PY - 2019/7/1
Y1 - 2019/7/1
N2 - We investigated various characteristics of chlorinated indium tin oxide (Cl-ITO)for highly efficient organic light-emitting diodes (OLEDs): the work function, surface morphology, wetting characteristic, and hole-injection property. Via the systematic analysis of Cl-ITO, we showed that the modification of ITO using the plasma treatment method has a simple process and offers higher stability than that achieved with a solution-based modification method. We fabricated Cl-ITO with a high work function of 6.04 eV, which is 1.04 eV higher than that of pristine ITO. We verified that Cl 2 plasma treatment does not affect the ITO surface morphology. The Cl halogenated surface showed a low surface polarity and influenced the growth of the organic material, especially for films as thin as ∼4 nm. Therefore, we found when using ultra-thin film on Cl-ITO for design devices, the wetting characteristic of Cl-ITO should be considered. In addition, using tris-(4-carbazoyl-9-ylphenyl)-amine resulted in increased current and power efficiencies compared with those obtained using 4,4′-N,N′-dicarbazolebiphenyl. When a carrier-only device was used, the carrier-injection characteristics of Cl-ITO were higher than those of other well-known hole-injection materials. Furthermore, the Cl-ITO OLEDs showed higher stability than OLEDs with other hole-injection materials.
AB - We investigated various characteristics of chlorinated indium tin oxide (Cl-ITO)for highly efficient organic light-emitting diodes (OLEDs): the work function, surface morphology, wetting characteristic, and hole-injection property. Via the systematic analysis of Cl-ITO, we showed that the modification of ITO using the plasma treatment method has a simple process and offers higher stability than that achieved with a solution-based modification method. We fabricated Cl-ITO with a high work function of 6.04 eV, which is 1.04 eV higher than that of pristine ITO. We verified that Cl 2 plasma treatment does not affect the ITO surface morphology. The Cl halogenated surface showed a low surface polarity and influenced the growth of the organic material, especially for films as thin as ∼4 nm. Therefore, we found when using ultra-thin film on Cl-ITO for design devices, the wetting characteristic of Cl-ITO should be considered. In addition, using tris-(4-carbazoyl-9-ylphenyl)-amine resulted in increased current and power efficiencies compared with those obtained using 4,4′-N,N′-dicarbazolebiphenyl. When a carrier-only device was used, the carrier-injection characteristics of Cl-ITO were higher than those of other well-known hole-injection materials. Furthermore, the Cl-ITO OLEDs showed higher stability than OLEDs with other hole-injection materials.
KW - Cl plasma treatment
KW - Indium tin oxide (ITO)
KW - Organic light-emitting diodes (OLEDs)
KW - Stability
KW - Wettability
KW - Work function
UR - http://www.scopus.com/inward/record.url?scp=85065518607&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85065518607&partnerID=8YFLogxK
U2 - 10.1016/j.optmat.2019.04.056
DO - 10.1016/j.optmat.2019.04.056
M3 - Article
VL - 93
SP - 51
EP - 57
JO - Optical Materials
JF - Optical Materials
SN - 0925-3467
ER -