Effects of coercive voltage and charge injection on memory windows of metal-ferroelectric-semiconductor and metal-ferroelectric-insulator- semiconductor gate structures

Sung Kyun Lee, Yong Tae Kim, Seong Il Kim, Cheol Eui Lee

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Abstract

We have prepared Pt/SrBi 2Ta 2O 9 (SBT)/Si metal-ferroelectric-semiconductor (MFS) and Pt/SBT/Y 2O 3/Si metal-ferroelectric-insulator-semiconductor (MFIS) ferroelectric gate structures and investigated the changes in memory window with different thickness of SBT and Y 2O 3 in the MFS and MFIS. As a result, it is found that the memory window increases with increasing thickness of SBT and decreasing thickness of Y 2O 3. The experimental and theoretical analysis reveals that the memory window equals to the difference between the effective coercive voltage (2V c) applied to the ferroelectric film and the flat band voltage shift due to charge injection (V ci). Increasing the thickness of SBT, the 2V c seems to be saturated at higher voltage, whereas the V ci starts to increase exponentially at the higher gate voltage. In contrast, the V ci decreases with decreasing thickness of Y 2O 3, resulting in the enhancement of the memory window due to the reduction of charge injection.

Original languageEnglish
Pages (from-to)9303-9307
Number of pages5
JournalJournal of Applied Physics
Volume91
Issue number11
DOIs
Publication statusPublished - 2002 Jun 1

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insulators
injection
electric potential
metals
high voltages
augmentation
shift

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Effects of coercive voltage and charge injection on memory windows of metal-ferroelectric-semiconductor and metal-ferroelectric-insulator- semiconductor gate structures. / Lee, Sung Kyun; Kim, Yong Tae; Kim, Seong Il; Lee, Cheol Eui.

In: Journal of Applied Physics, Vol. 91, No. 11, 01.06.2002, p. 9303-9307.

Research output: Contribution to journalArticle

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