Effects of deposition temperatures and annealing conditions on the microstructural, electrical and optical properties of polycrystalline Al-doped ZnO thin films

Engineering & Materials Science

• Optical properties 100%
• Electric properties 85%
• Annealing 79%
• Carrier concentration 76%
• Thin films 75%
• Furnaces 71%
• Hall mobility 53%
• Optical band gaps 53%
• Scattering 50%
• Rapid thermal annealing 41%
• Sapphire 35%
• Magnetron sputtering 35%
• Temperature 32%
• Grain boundaries 27%
• X ray diffraction 26%
• Impurities 25%
• Electron microscopes 25%
• Wavelength 23%
• Scanning 20%
• Substrates 18%
• Hot Temperature 12%

Chemical Compounds

• Polycrystalline Solid 71%
• Electrical Property 67%
• Annealing 63%
• Rapid Thermal Annealing 59%
• Optical Property 58%
• Magnetron Sputtering 46%
• Grain Boundary 41%
• Transmittance 40%
• Compound Mobility 30%
• Band Gap 30%
• Wavelength 28%
• Ambient Reaction Temperature 22%
• Electron Particle 21%
• X-Ray Diffraction 19%
• Liquid Film 19%
• Mixture 17%

Physics & Astronomy

• electrical properties 58%
• optical properties 52%
• annealing 48%
• thin films 41%
• furnaces 36%
• temperature 23%
• scattering 13%
• sapphire 11%
• magnetron sputtering 11%
• transmittance 11%
• electron microscopes 10%
• grain boundaries 9%
• impurities 8%
• electrical resistivity 8%
• scanning 8%
• room temperature 7%
• diffraction 7%
• wavelengths 6%
• x rays 6%