Effects of in-situ NH 3 post plasma treatment on the surface passivation layer

Kyung Dong Lee, Min Gu Kang, Young Do Kim, Sung Ju Tark, Sungeun Park, Donghwan Kim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Hydrogenated silicon nitride (SiN x:H) using plasma enhanced chemical vapor deposition is widely used in photovoltaic industry as an antireflection coating and passivation layer. The samples with or without in-situ NH 3 post-plasma treatment had the following structures: SiN x/N-type Si/SiN x versus in-situ NH 3 post-plasma treated SiN x/N-type Si/SiN x. The wafer was dipped in saw-damage-etching solution and wet cleaning process was treated. After the dry process with N 2 atmosphere, SiN x thin film was deposited on back surface. Then SiN x thin film was deposited on the front surface with or without in-situ NH 3 post-plasma treatment process. In order to minimize the plasma induced surface damage, we used lower power than the process power during the NH 3 post-plasma treatment. After the in-situ NH 3 post-plasma-treatment, we analyzed the effect of this in-situ NH 3 post-plasma-treatment for passivation. The minority carrier lifetime was observed by means of quasi-steady-state photoconductance and microwave photoconductance.

Original languageEnglish
Title of host publicationPhysics of Semiconductors - 30th International Conference on the Physics of Semiconductors, ICPS-30
Pages207-208
Number of pages2
DOIs
Publication statusPublished - 2011
Event30th International Conference on the Physics of Semiconductors, ICPS-30 - Seoul, Korea, Republic of
Duration: 2010 Jul 252010 Jul 30

Publication series

NameAIP Conference Proceedings
Volume1399
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Other

Other30th International Conference on the Physics of Semiconductors, ICPS-30
CountryKorea, Republic of
CitySeoul
Period10/7/2510/7/30

Keywords

  • NH post plasma treatment
  • PECVD
  • Passivation
  • SiN
  • minority carrier lifetime

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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  • Cite this

    Lee, K. D., Kang, M. G., Kim, Y. D., Tark, S. J., Park, S., & Kim, D. (2011). Effects of in-situ NH 3 post plasma treatment on the surface passivation layer. In Physics of Semiconductors - 30th International Conference on the Physics of Semiconductors, ICPS-30 (pp. 207-208). (AIP Conference Proceedings; Vol. 1399). https://doi.org/10.1063/1.3666328