Effects of surfactant concentration on step height reduction of SiO ₂ in chemical mechanical polishing with ceria slurry

B. J. Cho, Y. M. Lee, D. H. Shin, D. S. Lim, J. H. Shin, J. Y. Park, Y. S. Choi

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Citations (Scopus)

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