Effects of surfactant concentration on step height reduction of SiO 2 in chemical mechanical polishing with ceria slurry

B. J. Cho, Y. M. Lee, D. H. Shin, D. S. Lim, J. H. Shin, J. Y. Park, Y. S. Choi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Fingerprint Dive into the research topics of 'Effects of surfactant concentration on step height reduction of SiO <sub>2</sub> in chemical mechanical polishing with ceria slurry'. Together they form a unique fingerprint.

Engineering & Materials Science