TY - JOUR
T1 - Efficient confinement of ultraviolet light into a self-assembled, dielectric colloidal monolayer on a flat aluminum film
AU - Lee, Seungwoo
AU - Kim, Juyoung
PY - 2014/11/1
Y1 - 2014/11/1
N2 - Herein, we propose the efficient confinement of ultraviolet (UV) light into a self-assembled dielectric colloidal monolayer on a flat aluminum (Al) film. Using a numerical approach, we analyzed each different resonant mode at the UV wavelengths, including the surface plasmon polariton (SPP) and waveguided (WG) mode. The calculated quality-factors (Q-factors) of each resonant mode were at least one order of magnitude higher than those of the existing Al nanostructures. Finally, we examined the influence of the oxide contamination, induced during the Al deposition, on both the SPP and WG modes in order to develop strategies for a realistic experimental fabrication.
AB - Herein, we propose the efficient confinement of ultraviolet (UV) light into a self-assembled dielectric colloidal monolayer on a flat aluminum (Al) film. Using a numerical approach, we analyzed each different resonant mode at the UV wavelengths, including the surface plasmon polariton (SPP) and waveguided (WG) mode. The calculated quality-factors (Q-factors) of each resonant mode were at least one order of magnitude higher than those of the existing Al nanostructures. Finally, we examined the influence of the oxide contamination, induced during the Al deposition, on both the SPP and WG modes in order to develop strategies for a realistic experimental fabrication.
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U2 - 10.7567/APEX.7.112002
DO - 10.7567/APEX.7.112002
M3 - Article
AN - SCOPUS:84909992131
VL - 7
JO - Applied Physics Express
JF - Applied Physics Express
SN - 1882-0778
IS - 11
ER -