Efficient confinement of ultraviolet light into a self-assembled, dielectric colloidal monolayer on a flat aluminum film

Seungwoo Lee, Juyoung Kim

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Herein, we propose the efficient confinement of ultraviolet (UV) light into a self-assembled dielectric colloidal monolayer on a flat aluminum (Al) film. Using a numerical approach, we analyzed each different resonant mode at the UV wavelengths, including the surface plasmon polariton (SPP) and waveguided (WG) mode. The calculated quality-factors (Q-factors) of each resonant mode were at least one order of magnitude higher than those of the existing Al nanostructures. Finally, we examined the influence of the oxide contamination, induced during the Al deposition, on both the SPP and WG modes in order to develop strategies for a realistic experimental fabrication.

Original languageEnglish
Number of pages1
JournalApplied Physics Express
Volume7
Issue number11
DOIs
Publication statusPublished - 2014 Nov 1
Externally publishedYes

Fingerprint

ultraviolet radiation
Monolayers
aluminum
Aluminum
polaritons
Nanostructures
Contamination
Fabrication
Q factors
Wavelength
contamination
Oxides
fabrication
oxides
Ultraviolet Rays
wavelengths

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

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AB - Herein, we propose the efficient confinement of ultraviolet (UV) light into a self-assembled dielectric colloidal monolayer on a flat aluminum (Al) film. Using a numerical approach, we analyzed each different resonant mode at the UV wavelengths, including the surface plasmon polariton (SPP) and waveguided (WG) mode. The calculated quality-factors (Q-factors) of each resonant mode were at least one order of magnitude higher than those of the existing Al nanostructures. Finally, we examined the influence of the oxide contamination, induced during the Al deposition, on both the SPP and WG modes in order to develop strategies for a realistic experimental fabrication.

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