Electrical and structural properties of Ti/Au ohniic contacts to n-ZnO

Han Ki Kim, Sang Heon Han, Tae Yeon Seong, W. K. Choi

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83 Citations (Scopus)


We have investigated Ti/Au (30/50 nm) ohmic contacts to n-ZnO:Al. The samples are annealed at temperatures of 300 and 500°C for 60 s in a flowing N 2 atmosphere. Current-voltage measurements show that the as-deposited sample is ohmic with a specific contact resistance of 2 × 10 -2 Ω cm 2. However, annealing of the sample at 300°C results in much better ohmic behavior with a contact resistance of 2 × 10 -4 Ω cm 2. Further increase in annealing temperature (500°C) causes the degradation of the ohmic property. Glancing angle X-ray diffraction and Auger electron spectroscopy are used to investigate interfacial reactions between the Ti/Au and ZnO layers. It is shown that both rutile and srilankite TiO 2 phases are formed in the as-deposited and annealed samples. It is further shown that annealing at 500°C results in the formation of new phases such as Ti 3Au and TiAu 2. A possible explanation is given to describe the annealing temperature dependence of the specific contact resistance.

Original languageEnglish
JournalJournal of the Electrochemical Society
Issue number3
Publication statusPublished - 2001 Dec 1
Externally publishedYes

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

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