Electrical properties of e-beam exposed silicon dioxides and their application to nano-devices

B. H. Choi, S. K. Jung, S. I. Kim, S. W. Hwang, Jung ho Park, Y. Kim, E. K. Kim, S. K. Min

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 1998
Subtitle of host publication1998 International Microprocesses and Nanotechnology Conference
EditorsHyung Joon Yoo, Shinji Okazaki, Jinho Ahn, Ohyun Kim, Masanori Komuro
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages206-207
Number of pages2
Volume1998-July
ISBN (Electronic)4930813832, 9784930813831
DOIs
Publication statusPublished - 1998 Jan 1
Event1998 International Microprocesses and Nanotechnology Conference, MNC 1998 - Kyoungju, Korea, Republic of
Duration: 1998 Jul 131998 Jul 16

Other

Other1998 International Microprocesses and Nanotechnology Conference, MNC 1998
CountryKorea, Republic of
CityKyoungju
Period98/7/1398/7/16

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Silicon Dioxide
Electric properties

ASJC Scopus subject areas

  • Materials Science(all)
  • Nuclear and High Energy Physics
  • Computer Science Applications

Cite this

Choi, B. H., Jung, S. K., Kim, S. I., Hwang, S. W., Park, J. H., Kim, Y., ... Min, S. K. (1998). Electrical properties of e-beam exposed silicon dioxides and their application to nano-devices. In H. J. Yoo, S. Okazaki, J. Ahn, O. Kim, & M. Komuro (Eds.), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference (Vol. 1998-July, pp. 206-207). [730046] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.1998.730046

Electrical properties of e-beam exposed silicon dioxides and their application to nano-devices. / Choi, B. H.; Jung, S. K.; Kim, S. I.; Hwang, S. W.; Park, Jung ho; Kim, Y.; Kim, E. K.; Min, S. K.

Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. ed. / Hyung Joon Yoo; Shinji Okazaki; Jinho Ahn; Ohyun Kim; Masanori Komuro. Vol. 1998-July Institute of Electrical and Electronics Engineers Inc., 1998. p. 206-207 730046.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Choi, BH, Jung, SK, Kim, SI, Hwang, SW, Park, JH, Kim, Y, Kim, EK & Min, SK 1998, Electrical properties of e-beam exposed silicon dioxides and their application to nano-devices. in HJ Yoo, S Okazaki, J Ahn, O Kim & M Komuro (eds), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. vol. 1998-July, 730046, Institute of Electrical and Electronics Engineers Inc., pp. 206-207, 1998 International Microprocesses and Nanotechnology Conference, MNC 1998, Kyoungju, Korea, Republic of, 98/7/13. https://doi.org/10.1109/IMNC.1998.730046
Choi BH, Jung SK, Kim SI, Hwang SW, Park JH, Kim Y et al. Electrical properties of e-beam exposed silicon dioxides and their application to nano-devices. In Yoo HJ, Okazaki S, Ahn J, Kim O, Komuro M, editors, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. Vol. 1998-July. Institute of Electrical and Electronics Engineers Inc. 1998. p. 206-207. 730046 https://doi.org/10.1109/IMNC.1998.730046
Choi, B. H. ; Jung, S. K. ; Kim, S. I. ; Hwang, S. W. ; Park, Jung ho ; Kim, Y. ; Kim, E. K. ; Min, S. K. / Electrical properties of e-beam exposed silicon dioxides and their application to nano-devices. Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. editor / Hyung Joon Yoo ; Shinji Okazaki ; Jinho Ahn ; Ohyun Kim ; Masanori Komuro. Vol. 1998-July Institute of Electrical and Electronics Engineers Inc., 1998. pp. 206-207
@inproceedings{25c58e1a813643919557964d672ebdd8,
title = "Electrical properties of e-beam exposed silicon dioxides and their application to nano-devices",
author = "Choi, {B. H.} and Jung, {S. K.} and Kim, {S. I.} and Hwang, {S. W.} and Park, {Jung ho} and Y. Kim and Kim, {E. K.} and Min, {S. K.}",
year = "1998",
month = "1",
day = "1",
doi = "10.1109/IMNC.1998.730046",
language = "English",
volume = "1998-July",
pages = "206--207",
editor = "Yoo, {Hyung Joon} and Shinji Okazaki and Jinho Ahn and Ohyun Kim and Masanori Komuro",
booktitle = "Digest of Papers - Microprocesses and Nanotechnology 1998",
publisher = "Institute of Electrical and Electronics Engineers Inc.",

}

TY - GEN

T1 - Electrical properties of e-beam exposed silicon dioxides and their application to nano-devices

AU - Choi, B. H.

AU - Jung, S. K.

AU - Kim, S. I.

AU - Hwang, S. W.

AU - Park, Jung ho

AU - Kim, Y.

AU - Kim, E. K.

AU - Min, S. K.

PY - 1998/1/1

Y1 - 1998/1/1

UR - http://www.scopus.com/inward/record.url?scp=85051421356&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85051421356&partnerID=8YFLogxK

U2 - 10.1109/IMNC.1998.730046

DO - 10.1109/IMNC.1998.730046

M3 - Conference contribution

AN - SCOPUS:85051421356

VL - 1998-July

SP - 206

EP - 207

BT - Digest of Papers - Microprocesses and Nanotechnology 1998

A2 - Yoo, Hyung Joon

A2 - Okazaki, Shinji

A2 - Ahn, Jinho

A2 - Kim, Ohyun

A2 - Komuro, Masanori

PB - Institute of Electrical and Electronics Engineers Inc.

ER -