Transparent conducting aluminum-doped zinc oxide (AZO) thin films were deposited on Corning glass substrate using an Gun-type rf magnetron sputtering deposition technology. The AZO thin films were fabricated with an AZO ceramic target (Zn: 98wt.%, AL2O3: 2wt.%). The AZO thin films were deposited with various growth conditions such as the substrate temperature, oxygen pressure. X-ray diffraction (XRD), UV/visible spectroscope, atomic force microscope (AFM), and Hall effect measurement system were done in order to investigate the properties of the AZO thin films Among the AZO thin films prepared in this study, the one formed at conditions of the substrate temperature 100 °C, Ar 50 sccm, O2 5 sccm and working pressure 5 mtorr showed the best properties of an electrical resistivity of 1.763 × 10-4 [ω cm], a carrier concentration of 1.801 ×10 21 [cm-3], and a carrier mobility of 19.66 [cm 2/V-S], which indicates that it could be used as a transparent electrode for thin film transistor and flat panel display applications.
|Number of pages||6|
|Journal||Transactions of the Korean Institute of Electrical Engineers|
|Publication status||Published - 2009 Oct|
ASJC Scopus subject areas
- Electrical and Electronic Engineering