Electro-migration of impurities in TlBr

Kihyun Kim, Eunlim Kim, H. Kim, R. Tappero, A. E. Bolotnikov, G. S. Camarda, A. Hossain, L. Cirignano, R. B. James

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

We observed the electro-migration of Cu, Ag, and Au impurities that exist in positive-ion states in TlBr detectors under electric field strengths typically used for device operation. The migration occurred predominantly through bulk- and specific-channels, which are presumed to be a network of grain and sub-grain boundaries. The electro-migration velocity of Cu, Ag, and Au in TlBr is about 4-8 × 10-8 cm/s at room temperature under an electric field of 500-800 V/mm. The instability and polarization effects of TlBr detectors might well be correlated with the electro-migration of residual impurities in TlBr, which alters the internal electric field over time. The effect may also have been due to migration of the electrode material itself, which would allow for the possibility of a better choice for contact material and for depositing an effective diffusion barrier. From our findings, we suggest that applying our electro-migration technique for purifying material is a promising new way to remove electrically active metallic impurities in TlBr crystals, as well as other materials.

Original languageEnglish
Article number133701
JournalJournal of Applied Physics
Volume114
Issue number13
DOIs
Publication statusPublished - 2013 Oct 18

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electromigration
impurities
electric fields
detectors
electric field strength
electrode materials
positive ions
electric contacts
grain boundaries
room temperature
polarization
crystals

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Kim, K., Kim, E., Kim, H., Tappero, R., Bolotnikov, A. E., Camarda, G. S., ... James, R. B. (2013). Electro-migration of impurities in TlBr. Journal of Applied Physics, 114(13), [133701]. https://doi.org/10.1063/1.4823781

Electro-migration of impurities in TlBr. / Kim, Kihyun; Kim, Eunlim; Kim, H.; Tappero, R.; Bolotnikov, A. E.; Camarda, G. S.; Hossain, A.; Cirignano, L.; James, R. B.

In: Journal of Applied Physics, Vol. 114, No. 13, 133701, 18.10.2013.

Research output: Contribution to journalArticle

Kim, K, Kim, E, Kim, H, Tappero, R, Bolotnikov, AE, Camarda, GS, Hossain, A, Cirignano, L & James, RB 2013, 'Electro-migration of impurities in TlBr', Journal of Applied Physics, vol. 114, no. 13, 133701. https://doi.org/10.1063/1.4823781
Kim K, Kim E, Kim H, Tappero R, Bolotnikov AE, Camarda GS et al. Electro-migration of impurities in TlBr. Journal of Applied Physics. 2013 Oct 18;114(13). 133701. https://doi.org/10.1063/1.4823781
Kim, Kihyun ; Kim, Eunlim ; Kim, H. ; Tappero, R. ; Bolotnikov, A. E. ; Camarda, G. S. ; Hossain, A. ; Cirignano, L. ; James, R. B. / Electro-migration of impurities in TlBr. In: Journal of Applied Physics. 2013 ; Vol. 114, No. 13.
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