Electrochemical characteristics of amorphous silicon thin film electrode with fluoroethylene carbonate additive

Jung Sub Kim, Dongjin Byun, Joong Kee Lee

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

The electrochemical and compositional changes of a solid electrolyte interphase (SEI) layer formed on the surface of silicon thin film are investigated in order to determine the effect of the content of fluoroethylene carbonate (FEC) additive in the electrolyte. Comparisons are made with FEC-free electrolyte, in which the major components are (CH2OCO 2Li)2 and Li2CO3. The (CH 2OCO2Li)2 and Li2CO3 of the SEI layer in the FEC-containing electrolyte decreases, and polycarbonate and LiF increase relatively with the repression of -OCO2Li groups. The additive affects the composition of the SEI layer, which leads to lower resistance. The electrochemical performance regarding cycle retention, coulombic efficiency, rate capability, and discharge capacity in the FEC-containing cell are significantly enhanced compared to that of the FEC-free electrolyte. The observed optimum FEC concentration in the electrolyte is 1.5%, due to the reduced charge transfer and SEI resistance in our experimental range.

Original languageEnglish
Pages (from-to)596-602
Number of pages7
JournalCurrent Applied Physics
Volume14
Issue number4
DOIs
Publication statusPublished - 2014 Apr

Keywords

  • Amorphous materials
  • Chemical vapor deposition
  • Interface
  • Thin films

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy(all)

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