Abstract
We have investigated the carrier transport mechanism of nonalloyed Ti-based Ohmic contacts to n-AlGaN using current-voltage-temperature and the specific contact resistance-temperature relations. It is shown that the theoretical result obtained using the field emission mode through the shallow-donor-assisted tunneling model is in agreement with the experimental data, although there is a small deviation below 383 K. The deviation is attributed to an increase of the self-compensation between donor-type and acceptorlike defects. This indicates that the electronic transport of the AlGaN contacts is sensitively dependent on Ga and oxygen/nitrogen related surface point defects.
Original language | English |
---|---|
Article number | 046106 |
Journal | Journal of Applied Physics |
Volume | 100 |
Issue number | 4 |
DOIs | |
Publication status | Published - 2006 |
ASJC Scopus subject areas
- Physics and Astronomy(all)