Enhancement of emission characteristics for field-emitter arrays by optimizing the etched feature of the gate electrode

Hoon Kim, Sang Won Seo, Joo Won Lee, Jong Won Park, Yun-Hi Lee, Jin Jang, Byeong Kwon Ju

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Abstract

The crystallographic orientations of sputtered Cr films as a function of substrate temperature T s were characterized by SEM, XRD, and estimation of etched features. It was found that the tapering angle θ t of thin Cr films after reactive ion etching depends on the deposition conditions. In the case of nontapered-gated FEAs, emission properties were enhanced.

Original languageEnglish
Pages (from-to)186-192
Number of pages7
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number1 SPEC.
DOIs
Publication statusPublished - 2003 Jan 1

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ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

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