The crystallographic orientations of sputtered Cr films as a function of substrate temperature Ts were characterized by SEM, XRD, and estimation of etched features. It was found that the tapering angle θt of thin Cr films after reactive ion etching depends on the deposition conditions. In the case of nontapered-gated FEAs, emission properties were enhanced.
|Number of pages||7|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|Issue number||1 SPEC.|
|Publication status||Published - 2003 Jan|
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering