Enhancement of reconstructed image by noise reduction for mask inspection of EUVL (Extreme ultra-violet light) lithography

Jung Geun Jo, Min Chul Park, Byeong Kwon Ju, Sungjin Cho, Young Min Jhon, Jung Young Son

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In mask inspection of extreme ultra-violet lithography, defect sizes and locations are critical factors on semiconductor production. This paper addresses a simulated solution of phase retrieval method to reduce a fine dust suspended in the air or on the CCD surface. To reduce such noise, we introduce an image enhancement method. Experimental result shows the contaminated materials such as fine dust can be reduced by the suggested method.

Original languageEnglish
Title of host publicationWIO 2013 - 12th Workshop on Information Optics, Proceedings
DOIs
Publication statusPublished - 2013
Event2013 12th Workshop on Information Optics, WIO 2013 - Tenerife, Spain
Duration: 2013 Jul 152013 Jul 19

Publication series

NameWIO 2013 - 12th Workshop on Information Optics, Proceedings

Other

Other2013 12th Workshop on Information Optics, WIO 2013
CountrySpain
CityTenerife
Period13/7/1513/7/19

Keywords

  • dust
  • image enhancement
  • noise reduction
  • phase retrieval

ASJC Scopus subject areas

  • Computer Networks and Communications

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  • Cite this

    Jo, J. G., Park, M. C., Ju, B. K., Cho, S., Jhon, Y. M., & Son, J. Y. (2013). Enhancement of reconstructed image by noise reduction for mask inspection of EUVL (Extreme ultra-violet light) lithography. In WIO 2013 - 12th Workshop on Information Optics, Proceedings [6601262] (WIO 2013 - 12th Workshop on Information Optics, Proceedings). https://doi.org/10.1109/WIO.2013.6601262