Enhancing ambipolar carrier transport of black phosphorus field-effect transistors with Ni-P alloy contacts

Hyunik Park, Ji Hyun Kim

Research output: Contribution to journalArticle

Abstract

Reducing power consumption and leakage current in complementary metal-oxide semiconductors (CMOSs) has gained importance for further increasing the transistor density. An effective strategy to achieve this is to use ambipolar carrier transport that can exploit both holes and electrons in a single transistor. We report the enhancement of ambipolar behavior in black phosphorus (BP) field-effect transistors (FET) by forming a low-resistance Ni2P alloy contact via low-vacuum annealing at 250 °C, where the transformation of BP into Ni2P alloy selectively occurred at the source/drain electrodes with the BP channel remaining pristine. The N-channel current on/off ratio and field-effect electron carrier mobility of BP FETs were improved by 98% and 1290%, respectively. Our results suggest that high-performance ambipolar BP FETs with low-resistance ohmic contacts can be achieved via low-temperature vacuum annealing for next-generation CMOS applications.

Original languageEnglish
Pages (from-to)22439-22444
Number of pages6
JournalPhysical Chemistry Chemical Physics
Volume20
Issue number35
DOIs
Publication statusPublished - 2018 Jan 1

Fingerprint

Carrier transport
Field effect transistors
Phosphorus
phosphorus
field effect transistors
Semiconductors
low resistance
Vacuum
Oxides
CMOS
Transistors
transistors
Metals
Electrons
Annealing
low vacuum
annealing
Ohmic contacts
Carrier mobility
carrier mobility

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

Cite this

Enhancing ambipolar carrier transport of black phosphorus field-effect transistors with Ni-P alloy contacts. / Park, Hyunik; Kim, Ji Hyun.

In: Physical Chemistry Chemical Physics, Vol. 20, No. 35, 01.01.2018, p. 22439-22444.

Research output: Contribution to journalArticle

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