Epitaxial KNbO3:Yb3+,Er3+ nanopattern for enhanced upconversion photoluminescence

Heeyeon Park, Kyu Tae Lee, Soon Hong Kwon, In Hwan Ahn, Byunghoon Kim, Doo Hyun Ko, Woong Kim

Research output: Contribution to journalArticle

Abstract

Nanopatterned epitaxial films of upconversion (UC) materials are desirable for various applications such as display lighting, waveguides, and optical imaging. In this study, we demonstrate that a nanopatterned epitaxial film of a UC material can be fabricated by combining a sol–gel process and nanoimprint lithography. An epitaxial KNbO3:Yb3+,Er3+ film is grown on a lattice-matched SrTiO3 single-crystal substrate, which exhibits an approximately 70 times enhanced UC photoluminescence (PL) intensity compared to that of a non-epitaxial KNbO3:Yb3+,Er3+ film grown on a Si substrate. Moreover, the introduction of a nanopattern enhances the UCPL intensity ∼20 times compared to that of a planar film with the same volume of material. Our study paves the way for a better fundamental understanding and expansion in the application of UC materials.

Original languageEnglish
Article number152238
JournalJournal of Alloys and Compounds
Volume813
DOIs
Publication statusPublished - 2020 Jan 15

Keywords

  • Epitaxy
  • Nanoimprint
  • Nanopattern
  • Sol–gel
  • Upconversion

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry

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