Erosion of free-standing CVD diamond film

J. H. Kim, Dae-Soon Lim

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Two kinds of polished and unpolished free-standing films prepared by the d.c. plasma CVD method were impacted by SiC particles to understand erosion mechanism. Erosion damage caused by solid impact was characterized using a surface profilometer, scanning electron microscopy and Raman spectroscopy. A gradual decrease of surface roughness and a sharp reduction of crystallinity were observed for unpolished CVD films with increasing erosion time. It was found that smaller grains of diamond were removed in the early stage of erosion process, and larger grains were eroded with further impingement. By introduction of the regrowth method on polished diamond, a further understanding of erosion mechanism was achieved. Most of the surface fractures were initiated at the grain boundary.

Original languageEnglish
Pages (from-to)865-870
Number of pages6
JournalDiamond and Related Materials
Volume8
Issue number2-5
Publication statusPublished - 1999 Mar 1

Fingerprint

Diamond films
diamond films
erosion
Chemical vapor deposition
Erosion
vapor deposition
Diamond
Diamonds
diamonds
Plasma CVD
profilometers
impingement
Raman spectroscopy
crystallinity
surface roughness
Grain boundaries
grain boundaries
Surface roughness
damage
Scanning electron microscopy

Keywords

  • CVD
  • Free-standing
  • Infra-red
  • Mechanical properties

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Erosion of free-standing CVD diamond film. / Kim, J. H.; Lim, Dae-Soon.

In: Diamond and Related Materials, Vol. 8, No. 2-5, 01.03.1999, p. 865-870.

Research output: Contribution to journalArticle

Kim, J. H. ; Lim, Dae-Soon. / Erosion of free-standing CVD diamond film. In: Diamond and Related Materials. 1999 ; Vol. 8, No. 2-5. pp. 865-870.
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