Erratum

Effect of imprinting pressure on residual layer thickness in UV nano-imprint lithography (Journal of Vacuum Science and Technology B (2005) 23 (1102))

Research output: Contribution to journalArticle

Original languageEnglish
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume23
Issue number5
DOIs
Publication statusPublished - 2005 Dec 1

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Lithography
lithography
Vacuum
vacuum

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

Cite this

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title = "Erratum: Effect of imprinting pressure on residual layer thickness in UV nano-imprint lithography (Journal of Vacuum Science and Technology B (2005) 23 (1102))",
author = "Heon Lee",
year = "2005",
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journal = "Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
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