Erratum: Effect of imprinting pressure on residual layer thickness in UV nano-imprint lithography (Journal of Vacuum Science and Technology B (2005) 23 (1102))

Research output: Contribution to journalArticle

Original languageEnglish
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume23
Issue number5
DOIs
Publication statusPublished - 2005 Dec 1

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Surfaces and Interfaces
  • Physics and Astronomy (miscellaneous)

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