Erratum: Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))

Hyung Seok Park, Ho Hyun Shin, Man Young Sung, Woo Beom Choi, Seung Woo Choi, Sang Yong Park

Research output: Contribution to journalComment/debatepeer-review

Original languageEnglish
Article number079206
JournalJapanese journal of applied physics
Issue number7 PART 1
Publication statusPublished - 2012 Jul

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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