Erratum: Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))

Hyung Seok Park, Ho Hyun Shin, Man Young Sung, Woo Beom Choi, Seung Woo Choi, Sang Yong Park

Research output: Contribution to journalArticle

Original languageEnglish
Article number079206
JournalJapanese Journal of Applied Physics
Volume51
Issue number7 PART 1
DOIs
Publication statusPublished - 2012 Jul 1

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Nanoimprint lithography
lithography
Physics
Defects
physics
defects
Hot Temperature

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Erratum : Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808)). / Park, Hyung Seok; Shin, Ho Hyun; Sung, Man Young; Choi, Woo Beom; Choi, Seung Woo; Park, Sang Yong.

In: Japanese Journal of Applied Physics, Vol. 51, No. 7 PART 1, 079206, 01.07.2012.

Research output: Contribution to journalArticle

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