Erratum: Improvements of defects by patterning using thermal nanoimprint lithography (Japanese Journal of Applied Physics (2007) 46 (1808))

Hyung Seok Park, Ho Hyun Shin, Man Young Sung, Woo Beom Choi, Seung Woo Choi, Sang Yong Park

Research output: Contribution to journal › Comment/debate › peer-review

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