Etching characteristics of Ba(Mg1/3Ta2/3)O3 film by using Cl2/SF6 electron cyclotron resonance plasma

Kwang Ho Kwon, Seung Youl Kang, Sang Kyun Lee, Sung Ihl Kim, Nam Kwan Hong, Sahn Nahm, Young Sik Kim

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

We investigated the etch characteristics of Ba(Mg1/3Ta2/3)O3 (BMT) films using Cl2/SF6 gas mixtures with electron cyclotron resonance plasma. The etch rate in pure Cl2 gas plasma was approximately 1250 Å/min and was decreased by the addition of SF6. By quadrupole mass spectrometer analysis, we found that the etch rate had a close relationship to the Cl radical. The surface reaction on the BMT films during the etch was examined by X-ray photoelectron spectroscopy analysis. It is proposed that the BaClxOy compound has been formed by Cl2 gas plasma. The chemical surface reaction and BMT etch characteristics with SF6/Cl2 gas chemistries are discussed in detail.

Original languageEnglish
JournalJournal of the Electrochemical Society
Volume149
Issue number5
DOIs
Publication statusPublished - 2002 May 1

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Plasma Gases
Electron cyclotron resonance
Surface reactions
electron cyclotron resonance
Etching
etching
Plasmas
surface reactions
Mass spectrometers
Gases
gases
Gas mixtures
X ray photoelectron spectroscopy
mass spectrometers
gas mixtures
quadrupoles
photoelectron spectroscopy
chemistry
x rays

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Etching characteristics of Ba(Mg1/3Ta2/3)O3 film by using Cl2/SF6 electron cyclotron resonance plasma. / Kwon, Kwang Ho; Kang, Seung Youl; Lee, Sang Kyun; Kim, Sung Ihl; Hong, Nam Kwan; Nahm, Sahn; Kim, Young Sik.

In: Journal of the Electrochemical Society, Vol. 149, No. 5, 01.05.2002.

Research output: Contribution to journalArticle

Kwon, Kwang Ho ; Kang, Seung Youl ; Lee, Sang Kyun ; Kim, Sung Ihl ; Hong, Nam Kwan ; Nahm, Sahn ; Kim, Young Sik. / Etching characteristics of Ba(Mg1/3Ta2/3)O3 film by using Cl2/SF6 electron cyclotron resonance plasma. In: Journal of the Electrochemical Society. 2002 ; Vol. 149, No. 5.
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AU - Hong, Nam Kwan

AU - Nahm, Sahn

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