Evaluating mechanical properties of 100nm-thick atomic layer deposited Al2O3 as a free-standing film

Junmo Koo, Sangmin Lee, Junmo Kim, Dong Hwan Kim, Byoung Ho Choi, Taek Soo Kim, Joon Hyung Shim

Research output: Contribution to journalArticle

Abstract

Due to the reduced thickness of thin films formed via atomic layer deposition, analyzing their true mechanical properties is difficult. To overcome this drawback, tensile tests on free-standing alumina thin films floating on water were conducted to measure their mechanical properties. Tensile tests on alumina thin films formed at different deposition temperatures were also conducted; the results indicated that higher Young's modulus and the strength were obtained from thin films formed at higher deposition temperatures. Factors responsible for the variations in mechanical properties were investigated through analyses of the structure, density, and composition of the films.

Original languageEnglish
Pages (from-to)256-261
Number of pages6
JournalScripta Materialia
Volume187
DOIs
Publication statusPublished - 2020 Oct

Keywords

  • Alumina
  • Atomic layer deposition
  • Mechanical properties
  • Tensile test
  • Thin film

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys

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