Fabrication of 100 nm metal lines on flexible plastic substrate using ultraviolet curing nanoimprint lithography

Heon Lee, Sunghoon Hong, Kiyeon Yang, Kyungwoo Choi

Research output: Contribution to journalArticle

59 Citations (Scopus)

Abstract

Since polymer is flexible, lightweight, reliable and transparent and its material properties can easily be modified, it is a suitable substrate material for organic electronic devices, biomedical devices, and especially for flexible displays. To build a nano-device on a polymer substrate, nano to microsized patterning must be done. However, conventional photolithography cannot be used to fabricate patterns on flexible polymer substrate, due to the focusing and substrate handling issue associated with flexibility of polymer substrate and potential interaction between polymer and developer or other organic solvents used in photolithography. Degradation of polymer substrate during resist baking process over 120°C can be another problem. In this study, 100 nm sized resist patterns were made on flexible polyethylene-terephthalate (PET) film using newly developed monomer based UV curing imprinting lithography. Compared to conventional imprint lithography, UV curing imprint lithography uses monomer based liquid phase resin and thus patterns can be fabricated without residual layer at room temperature and at much lower pressure (<3-5 atm) with UV illumination. No degradation of PET film was observed due to the imprint process and, as a result, 100 nm sized Ti-Au metal patterns were successfully formed on PET film using UV curing imprint lithography and lift-off process.

Original languageEnglish
Article number143112
JournalApplied Physics Letters
Volume88
Issue number14
DOIs
Publication statusPublished - 2006 Apr 3

Fingerprint

curing
plastics
lithography
fabrication
polyethylene terephthalate
polymers
metals
photolithography
monomers
degradation
transparence
baking
photographic developers
resins
flexibility
liquid phases
low pressure
illumination
room temperature
electronics

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Fabrication of 100 nm metal lines on flexible plastic substrate using ultraviolet curing nanoimprint lithography. / Lee, Heon; Hong, Sunghoon; Yang, Kiyeon; Choi, Kyungwoo.

In: Applied Physics Letters, Vol. 88, No. 14, 143112, 03.04.2006.

Research output: Contribution to journalArticle

@article{b0a2b80e0b6f49d7b59bed89c1e1018b,
title = "Fabrication of 100 nm metal lines on flexible plastic substrate using ultraviolet curing nanoimprint lithography",
abstract = "Since polymer is flexible, lightweight, reliable and transparent and its material properties can easily be modified, it is a suitable substrate material for organic electronic devices, biomedical devices, and especially for flexible displays. To build a nano-device on a polymer substrate, nano to microsized patterning must be done. However, conventional photolithography cannot be used to fabricate patterns on flexible polymer substrate, due to the focusing and substrate handling issue associated with flexibility of polymer substrate and potential interaction between polymer and developer or other organic solvents used in photolithography. Degradation of polymer substrate during resist baking process over 120°C can be another problem. In this study, 100 nm sized resist patterns were made on flexible polyethylene-terephthalate (PET) film using newly developed monomer based UV curing imprinting lithography. Compared to conventional imprint lithography, UV curing imprint lithography uses monomer based liquid phase resin and thus patterns can be fabricated without residual layer at room temperature and at much lower pressure (<3-5 atm) with UV illumination. No degradation of PET film was observed due to the imprint process and, as a result, 100 nm sized Ti-Au metal patterns were successfully formed on PET film using UV curing imprint lithography and lift-off process.",
author = "Heon Lee and Sunghoon Hong and Kiyeon Yang and Kyungwoo Choi",
year = "2006",
month = "4",
day = "3",
doi = "10.1063/1.2193653",
language = "English",
volume = "88",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "14",

}

TY - JOUR

T1 - Fabrication of 100 nm metal lines on flexible plastic substrate using ultraviolet curing nanoimprint lithography

AU - Lee, Heon

AU - Hong, Sunghoon

AU - Yang, Kiyeon

AU - Choi, Kyungwoo

PY - 2006/4/3

Y1 - 2006/4/3

N2 - Since polymer is flexible, lightweight, reliable and transparent and its material properties can easily be modified, it is a suitable substrate material for organic electronic devices, biomedical devices, and especially for flexible displays. To build a nano-device on a polymer substrate, nano to microsized patterning must be done. However, conventional photolithography cannot be used to fabricate patterns on flexible polymer substrate, due to the focusing and substrate handling issue associated with flexibility of polymer substrate and potential interaction between polymer and developer or other organic solvents used in photolithography. Degradation of polymer substrate during resist baking process over 120°C can be another problem. In this study, 100 nm sized resist patterns were made on flexible polyethylene-terephthalate (PET) film using newly developed monomer based UV curing imprinting lithography. Compared to conventional imprint lithography, UV curing imprint lithography uses monomer based liquid phase resin and thus patterns can be fabricated without residual layer at room temperature and at much lower pressure (<3-5 atm) with UV illumination. No degradation of PET film was observed due to the imprint process and, as a result, 100 nm sized Ti-Au metal patterns were successfully formed on PET film using UV curing imprint lithography and lift-off process.

AB - Since polymer is flexible, lightweight, reliable and transparent and its material properties can easily be modified, it is a suitable substrate material for organic electronic devices, biomedical devices, and especially for flexible displays. To build a nano-device on a polymer substrate, nano to microsized patterning must be done. However, conventional photolithography cannot be used to fabricate patterns on flexible polymer substrate, due to the focusing and substrate handling issue associated with flexibility of polymer substrate and potential interaction between polymer and developer or other organic solvents used in photolithography. Degradation of polymer substrate during resist baking process over 120°C can be another problem. In this study, 100 nm sized resist patterns were made on flexible polyethylene-terephthalate (PET) film using newly developed monomer based UV curing imprinting lithography. Compared to conventional imprint lithography, UV curing imprint lithography uses monomer based liquid phase resin and thus patterns can be fabricated without residual layer at room temperature and at much lower pressure (<3-5 atm) with UV illumination. No degradation of PET film was observed due to the imprint process and, as a result, 100 nm sized Ti-Au metal patterns were successfully formed on PET film using UV curing imprint lithography and lift-off process.

UR - http://www.scopus.com/inward/record.url?scp=33645672608&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33645672608&partnerID=8YFLogxK

U2 - 10.1063/1.2193653

DO - 10.1063/1.2193653

M3 - Article

AN - SCOPUS:33645672608

VL - 88

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 14

M1 - 143112

ER -