Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography

H. Lee; J. Y. Huh; K. Y. Yang; S. Hong; G. Y. Jung

doi:10.4028/3-908451-30-2.665

Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography

H. Lee, J. Y. Huh, K. Y. Yang, S. Hong, G. Y. Jung

Department of Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

5 Citations (Scopus)

Abstract

A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.

Original language	English
Title of host publication	Nanoscience and Technology
Publisher	Trans Tech Publications Ltd
Pages	665-668
Number of pages	4
Edition	PART 1
ISBN (Print)	3908451302, 9783908451303
DOIs	https://doi.org/10.4028/3-908451-30-2.665
Publication status	Published - 2007
Event	China International Conference on Nanoscience and Technology, ChinaNANO 2005 - Beijing, China Duration: 2005 Jun 9 → 2005 Jun 11

Publication series

Name	Solid State Phenomena
Number	PART 1
Volume	121-123
ISSN (Print)	1012-0394

Other

Other	China International Conference on Nanoscience and Technology, ChinaNANO 2005
Country	China
City	Beijing
Period	05/6/9 → 05/6/11

Keywords

Flexible template
Nano -pattern duplication
Nano-imprint lithography
Polymer template
Thermally curable monomer resin
UV curable monomer resin

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Materials Science(all)
Condensed Matter Physics

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Cite this

Lee, H., Huh, J. Y., Yang, K. Y., Hong, S., & Jung, G. Y. (2007). Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography. In Nanoscience and Technology (PART 1 ed., pp. 665-668). (Solid State Phenomena; Vol. 121-123, No. PART 1). Trans Tech Publications Ltd. https://doi.org/10.4028/3-908451-30-2.665

Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography. / Lee, H.; Huh, J. Y.; Yang, K. Y.; Hong, S.; Jung, G. Y.

Nanoscience and Technology. PART 1. ed. Trans Tech Publications Ltd, 2007. p. 665-668 (Solid State Phenomena; Vol. 121-123, No. PART 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Lee, H , Huh, JY, Yang, KY, Hong, S & Jung, GY 2007, Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography. in Nanoscience and Technology. PART 1 edn, Solid State Phenomena, no. PART 1, vol. 121-123, Trans Tech Publications Ltd, pp. 665-668, China International Conference on Nanoscience and Technology, ChinaNANO 2005, Beijing, China, 05/6/9. https://doi.org/10.4028/3-908451-30-2.665

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