TY - GEN
T1 - Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography
AU - Lee, H.
AU - Huh, J. Y.
AU - Yang, K. Y.
AU - Hong, S.
AU - Jung, G. Y.
N1 - Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2007
Y1 - 2007
N2 - A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.
AB - A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.
KW - Flexible template
KW - Nano -pattern duplication
KW - Nano-imprint lithography
KW - Polymer template
KW - Thermally curable monomer resin
KW - UV curable monomer resin
UR - http://www.scopus.com/inward/record.url?scp=34648814781&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=34648814781&partnerID=8YFLogxK
U2 - 10.4028/3-908451-30-2.665
DO - 10.4028/3-908451-30-2.665
M3 - Conference contribution
AN - SCOPUS:34648814781
SN - 3908451302
SN - 9783908451303
T3 - Solid State Phenomena
SP - 665
EP - 668
BT - Nanoscience and Technology
PB - Trans Tech Publications Ltd
T2 - China International Conference on Nanoscience and Technology, ChinaNANO 2005
Y2 - 9 June 2005 through 11 June 2005
ER -