Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography

H. Lee; J. Y. Huh; K. Y. Yang; S. Hong; G. Y. Jung

doi:10.4028/3-908451-30-2.665

Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography

H. Lee, J. Y. Huh, K. Y. Yang, S. Hong, G. Y. Jung

Department of Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

5 Citations (Scopus)

Abstract

A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.

Original language	English
Title of host publication	Nanoscience and Technology
Publisher	Trans Tech Publications Ltd
Pages	665-668
Number of pages	4
Edition	PART 1
ISBN (Print)	3908451302, 9783908451303
DOIs	https://doi.org/10.4028/3-908451-30-2.665
Publication status	Published - 2007
Event	China International Conference on Nanoscience and Technology, ChinaNANO 2005 - Beijing, China Duration: 2005 Jun 9 → 2005 Jun 11

Publication series

Name	Solid State Phenomena
Number	PART 1
Volume	121-123
ISSN (Print)	1012-0394

Other

Other	China International Conference on Nanoscience and Technology, ChinaNANO 2005
Country/Territory	China
City	Beijing
Period	05/6/9 → 05/6/11

Keywords

Flexible template
Nano -pattern duplication
Nano-imprint lithography
Polymer template
Thermally curable monomer resin
UV curable monomer resin

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Materials Science(all)
Condensed Matter Physics

Access to Document

10.4028/3-908451-30-2.665

Cite this

Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography. / Lee, H.; Huh, J. Y.; Yang, K. Y.; Hong, S.; Jung, G. Y.

Nanoscience and Technology. PART 1. ed. Trans Tech Publications Ltd, 2007. p. 665-668 (Solid State Phenomena; Vol. 121-123, No. PART 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Lee, H , Huh, JY, Yang, KY, Hong, S & Jung, GY 2007, Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography. in Nanoscience and Technology. PART 1 edn, Solid State Phenomena, no. PART 1, vol. 121-123, Trans Tech Publications Ltd, pp. 665-668, China International Conference on Nanoscience and Technology, ChinaNANO 2005, Beijing, China, 05/6/9. https://doi.org/10.4028/3-908451-30-2.665

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abstract = "A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.",

keywords = "Flexible template, Nano -pattern duplication, Nano-imprint lithography, Polymer template, Thermally curable monomer resin, UV curable monomer resin",

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AU - Yang, K. Y.

AU - Hong, S.

AU - Jung, G. Y.

PY - 2007

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N2 - A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.

AB - A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.

KW - Flexible template

KW - Nano -pattern duplication

KW - Nano-imprint lithography

KW - Polymer template

KW - Thermally curable monomer resin

KW - UV curable monomer resin

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SN - 9783908451303

T3 - Solid State Phenomena

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BT - Nanoscience and Technology

PB - Trans Tech Publications Ltd

T2 - China International Conference on Nanoscience and Technology, ChinaNANO 2005

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Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography

Abstract

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Keywords

ASJC Scopus subject areas

Access to Document

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