Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography

H. Lee, J. Y. Huh, K. Y. Yang, S. Hong, G. Y. Jung

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.

Original languageEnglish
Title of host publicationNanoscience and Technology
PublisherTrans Tech Publications Ltd
Pages665-668
Number of pages4
EditionPART 1
ISBN (Print)3908451302, 9783908451303
DOIs
Publication statusPublished - 2007
EventChina International Conference on Nanoscience and Technology, ChinaNANO 2005 - Beijing, China
Duration: 2005 Jun 92005 Jun 11

Publication series

NameSolid State Phenomena
NumberPART 1
Volume121-123
ISSN (Print)1012-0394

Other

OtherChina International Conference on Nanoscience and Technology, ChinaNANO 2005
CountryChina
CityBeijing
Period05/6/905/6/11

Keywords

  • Flexible template
  • Nano -pattern duplication
  • Nano-imprint lithography
  • Polymer template
  • Thermally curable monomer resin
  • UV curable monomer resin

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

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  • Cite this

    Lee, H., Huh, J. Y., Yang, K. Y., Hong, S., & Jung, G. Y. (2007). Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography. In Nanoscience and Technology (PART 1 ed., pp. 665-668). (Solid State Phenomena; Vol. 121-123, No. PART 1). Trans Tech Publications Ltd. https://doi.org/10.4028/3-908451-30-2.665