Abstract
A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.
| Original language | English |
|---|---|
| Title of host publication | Diffusion and Defect Data Pt.B: Solid State Phenomena |
| Pages | 665-668 |
| Number of pages | 4 |
| Volume | 121-123 |
| Edition | PART 1 |
| Publication status | Published - 2007 Dec 1 |
| Event | China International Conference on Nanoscience and Technology, ChinaNANO 2005 - Beijing, China Duration: 2005 Jun 9 → 2005 Jun 11 |
Publication series
| Name | Diffusion and Defect Data Pt.B: Solid State Phenomena |
|---|---|
| Number | PART 1 |
| Volume | 121-123 |
| ISSN (Print) | 10120394 |
Other
| Other | China International Conference on Nanoscience and Technology, ChinaNANO 2005 |
|---|---|
| Country | China |
| City | Beijing |
| Period | 05/6/9 → 05/6/11 |
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Keywords
- Flexible template
- Nano -pattern duplication
- Nano-imprint lithography
- Polymer template
- Thermally curable monomer resin
- UV curable monomer resin
ASJC Scopus subject areas
- Materials Science(all)
- Physics and Astronomy (miscellaneous)
- Condensed Matter Physics
- Electronic, Optical and Magnetic Materials
Cite this
Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography. / Lee, Heon; Huh, Joo Youl; Yang, K. Y.; Hong, S.; Jung, G. Y.
Diffusion and Defect Data Pt.B: Solid State Phenomena. Vol. 121-123 PART 1. ed. 2007. p. 665-668 (Diffusion and Defect Data Pt.B: Solid State Phenomena; Vol. 121-123, No. PART 1).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Fabrication of 100nm sized patterns on a non-planar substrate by using nanoimprinting lithography
AU - Lee, Heon
AU - Huh, Joo Youl
AU - Yang, K. Y.
AU - Hong, S.
AU - Jung, G. Y.
PY - 2007/12/1
Y1 - 2007/12/1
N2 - A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.
AB - A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.
KW - Flexible template
KW - Nano -pattern duplication
KW - Nano-imprint lithography
KW - Polymer template
KW - Thermally curable monomer resin
KW - UV curable monomer resin
UR - http://www.scopus.com/inward/record.url?scp=34648814781&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=34648814781&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:34648814781
SN - 3908451302
SN - 9783908451303
VL - 121-123
T3 - Diffusion and Defect Data Pt.B: Solid State Phenomena
SP - 665
EP - 668
BT - Diffusion and Defect Data Pt.B: Solid State Phenomena
ER -