Abstract
In order to build a nano-device on polymer substrate, nano-size patterning must be done. However, conventional photolithography cannot be used to fabricate nano-sized patterns on polymer film due to the flexibility of polymer film and its potential interaction with developer solution and organic solvent. In this study, 100nm sized dense line and space patterns were made on flexible PET (polyethylene-terephthalate) substrate using newly developed monomer based imprinting lithography. Compared to hot embossing lithography, thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase and polymerization temperature is much lower than glass temperature of polymer, the nano-sized patterns can be transfer at much lower temperature and pressure. Hence, patterns as small as lOOnm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85°C and 5atm.
| Original language | English |
|---|---|
| Title of host publication | Diffusion and Defect Data Pt.B: Solid State Phenomena |
| Pages | 657-660 |
| Number of pages | 4 |
| Volume | 121-123 |
| Edition | PART 1 |
| Publication status | Published - 2007 Dec 1 |
| Event | China International Conference on Nanoscience and Technology, ChinaNANO 2005 - Beijing, China Duration: 2005 Jun 9 → 2005 Jun 11 |
Publication series
| Name | Diffusion and Defect Data Pt.B: Solid State Phenomena |
|---|---|
| Number | PART 1 |
| Volume | 121-123 |
| ISSN (Print) | 10120394 |
Other
| Other | China International Conference on Nanoscience and Technology, ChinaNANO 2005 |
|---|---|
| Country | China |
| City | Beijing |
| Period | 05/6/9 → 05/6/11 |
Fingerprint
Keywords
- Flexible substrate
- Nanoimprint lithography
- Polyethylene-Terephthalate film
- Thermally curable monomer
ASJC Scopus subject areas
- Materials Science(all)
- Physics and Astronomy (miscellaneous)
- Condensed Matter Physics
- Electronic, Optical and Magnetic Materials
Cite this
Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography. / Lee, Heon; Yang, K. Y.; Hong, S.
Diffusion and Defect Data Pt.B: Solid State Phenomena. Vol. 121-123 PART 1. ed. 2007. p. 657-660 (Diffusion and Defect Data Pt.B: Solid State Phenomena; Vol. 121-123, No. PART 1).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography
AU - Lee, Heon
AU - Yang, K. Y.
AU - Hong, S.
PY - 2007/12/1
Y1 - 2007/12/1
N2 - In order to build a nano-device on polymer substrate, nano-size patterning must be done. However, conventional photolithography cannot be used to fabricate nano-sized patterns on polymer film due to the flexibility of polymer film and its potential interaction with developer solution and organic solvent. In this study, 100nm sized dense line and space patterns were made on flexible PET (polyethylene-terephthalate) substrate using newly developed monomer based imprinting lithography. Compared to hot embossing lithography, thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase and polymerization temperature is much lower than glass temperature of polymer, the nano-sized patterns can be transfer at much lower temperature and pressure. Hence, patterns as small as lOOnm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85°C and 5atm.
AB - In order to build a nano-device on polymer substrate, nano-size patterning must be done. However, conventional photolithography cannot be used to fabricate nano-sized patterns on polymer film due to the flexibility of polymer film and its potential interaction with developer solution and organic solvent. In this study, 100nm sized dense line and space patterns were made on flexible PET (polyethylene-terephthalate) substrate using newly developed monomer based imprinting lithography. Compared to hot embossing lithography, thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase and polymerization temperature is much lower than glass temperature of polymer, the nano-sized patterns can be transfer at much lower temperature and pressure. Hence, patterns as small as lOOnm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85°C and 5atm.
KW - Flexible substrate
KW - Nanoimprint lithography
KW - Polyethylene-Terephthalate film
KW - Thermally curable monomer
UR - http://www.scopus.com/inward/record.url?scp=38549175269&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=38549175269&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:38549175269
SN - 3908451302
SN - 9783908451303
VL - 121-123
T3 - Diffusion and Defect Data Pt.B: Solid State Phenomena
SP - 657
EP - 660
BT - Diffusion and Defect Data Pt.B: Solid State Phenomena
ER -