TY - GEN
T1 - Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography
AU - Lee, H.
AU - Yang, K. Y.
AU - Hong, S.
N1 - Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2007
Y1 - 2007
N2 - In order to build a nano-device on polymer substrate, nano-size patterning must be done. However, conventional photolithography cannot be used to fabricate nano-sized patterns on polymer film due to the flexibility of polymer film and its potential interaction with developer solution and organic solvent. In this study, 100nm sized dense line and space patterns were made on flexible PET (polyethylene-terephthalate) substrate using newly developed monomer based imprinting lithography. Compared to hot embossing lithography, thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase and polymerization temperature is much lower than glass temperature of polymer, the nano-sized patterns can be transfer at much lower temperature and pressure. Hence, patterns as small as lOOnm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85°C and 5atm.
AB - In order to build a nano-device on polymer substrate, nano-size patterning must be done. However, conventional photolithography cannot be used to fabricate nano-sized patterns on polymer film due to the flexibility of polymer film and its potential interaction with developer solution and organic solvent. In this study, 100nm sized dense line and space patterns were made on flexible PET (polyethylene-terephthalate) substrate using newly developed monomer based imprinting lithography. Compared to hot embossing lithography, thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase and polymerization temperature is much lower than glass temperature of polymer, the nano-sized patterns can be transfer at much lower temperature and pressure. Hence, patterns as small as lOOnm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85°C and 5atm.
KW - Flexible substrate
KW - Nanoimprint lithography
KW - Polyethylene-Terephthalate film
KW - Thermally curable monomer
UR - http://www.scopus.com/inward/record.url?scp=38549175269&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=38549175269&partnerID=8YFLogxK
U2 - 10.4028/www.scientific.net/ssp.121-123.657
DO - 10.4028/www.scientific.net/ssp.121-123.657
M3 - Conference contribution
AN - SCOPUS:38549175269
SN - 3908451302
SN - 9783908451303
T3 - Solid State Phenomena
SP - 657
EP - 660
BT - Nanoscience and Technology
PB - Trans Tech Publications Ltd
T2 - China International Conference on Nanoscience and Technology, ChinaNANO 2005
Y2 - 9 June 2005 through 11 June 2005
ER -