Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography

Heon Lee, K. Y. Yang, S. Hong

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In order to build a nano-device on polymer substrate, nano-size patterning must be done. However, conventional photolithography cannot be used to fabricate nano-sized patterns on polymer film due to the flexibility of polymer film and its potential interaction with developer solution and organic solvent. In this study, 100nm sized dense line and space patterns were made on flexible PET (polyethylene-terephthalate) substrate using newly developed monomer based imprinting lithography. Compared to hot embossing lithography, thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase and polymerization temperature is much lower than glass temperature of polymer, the nano-sized patterns can be transfer at much lower temperature and pressure. Hence, patterns as small as lOOnm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85°C and 5atm.

Original languageEnglish
Title of host publicationDiffusion and Defect Data Pt.B: Solid State Phenomena
Pages657-660
Number of pages4
Volume121-123
EditionPART 1
Publication statusPublished - 2007 Dec 1
EventChina International Conference on Nanoscience and Technology, ChinaNANO 2005 - Beijing, China
Duration: 2005 Jun 92005 Jun 11

Publication series

NameDiffusion and Defect Data Pt.B: Solid State Phenomena
NumberPART 1
Volume121-123
ISSN (Print)10120394

Other

OtherChina International Conference on Nanoscience and Technology, ChinaNANO 2005
CountryChina
CityBeijing
Period05/6/905/6/11

Fingerprint

Nanoimprint lithography
Polyethylene Terephthalates
polyethylene terephthalate
curing
Polyethylene terephthalates
Lithography
Curing
lithography
monomers
Monomers
Fabrication
fabrication
polymers
Substrates
Polymer films
Polymers
embossing
photographic developers
Photolithography
initiators

Keywords

  • Flexible substrate
  • Nanoimprint lithography
  • Polyethylene-Terephthalate film
  • Thermally curable monomer

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

Cite this

Lee, H., Yang, K. Y., & Hong, S. (2007). Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography. In Diffusion and Defect Data Pt.B: Solid State Phenomena (PART 1 ed., Vol. 121-123, pp. 657-660). (Diffusion and Defect Data Pt.B: Solid State Phenomena; Vol. 121-123, No. PART 1).

Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography. / Lee, Heon; Yang, K. Y.; Hong, S.

Diffusion and Defect Data Pt.B: Solid State Phenomena. Vol. 121-123 PART 1. ed. 2007. p. 657-660 (Diffusion and Defect Data Pt.B: Solid State Phenomena; Vol. 121-123, No. PART 1).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Lee, H, Yang, KY & Hong, S 2007, Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography. in Diffusion and Defect Data Pt.B: Solid State Phenomena. PART 1 edn, vol. 121-123, Diffusion and Defect Data Pt.B: Solid State Phenomena, no. PART 1, vol. 121-123, pp. 657-660, China International Conference on Nanoscience and Technology, ChinaNANO 2005, Beijing, China, 05/6/9.
Lee H, Yang KY, Hong S. Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography. In Diffusion and Defect Data Pt.B: Solid State Phenomena. PART 1 ed. Vol. 121-123. 2007. p. 657-660. (Diffusion and Defect Data Pt.B: Solid State Phenomena; PART 1).
Lee, Heon ; Yang, K. Y. ; Hong, S. / Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography. Diffusion and Defect Data Pt.B: Solid State Phenomena. Vol. 121-123 PART 1. ed. 2007. pp. 657-660 (Diffusion and Defect Data Pt.B: Solid State Phenomena; PART 1).
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