Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography

H. Lee; K. Y. Yang; S. Hong

doi:10.4028/www.scientific.net/ssp.121-123.657

Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography

H. Lee, K. Y. Yang, S. Hong

Department of Materials Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In order to build a nano-device on polymer substrate, nano-size patterning must be done. However, conventional photolithography cannot be used to fabricate nano-sized patterns on polymer film due to the flexibility of polymer film and its potential interaction with developer solution and organic solvent. In this study, 100nm sized dense line and space patterns were made on flexible PET (polyethylene-terephthalate) substrate using newly developed monomer based imprinting lithography. Compared to hot embossing lithography, thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase and polymerization temperature is much lower than glass temperature of polymer, the nano-sized patterns can be transfer at much lower temperature and pressure. Hence, patterns as small as lOOnm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85°C and 5atm.

Original language	English
Title of host publication	Nanoscience and Technology
Publisher	Trans Tech Publications Ltd
Pages	657-660
Number of pages	4
Edition	PART 1
ISBN (Print)	3908451302, 9783908451303
DOIs	https://doi.org/10.4028/www.scientific.net/ssp.121-123.657
Publication status	Published - 2007
Event	China International Conference on Nanoscience and Technology, ChinaNANO 2005 - Beijing, China Duration: 2005 Jun 9 → 2005 Jun 11

Publication series

Name	Solid State Phenomena
Number	PART 1
Volume	121-123
ISSN (Print)	1012-0394

Other

Other	China International Conference on Nanoscience and Technology, ChinaNANO 2005
Country	China
City	Beijing
Period	05/6/9 → 05/6/11

Keywords

Flexible substrate
Nanoimprint lithography
Polyethylene-Terephthalate film
Thermally curable monomer

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Materials Science(all)
Condensed Matter Physics

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Lee, H., Yang, K. Y., & Hong, S. (2007). Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography. In Nanoscience and Technology (PART 1 ed., pp. 657-660). (Solid State Phenomena; Vol. 121-123, No. PART 1). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/ssp.121-123.657

Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography. / Lee, H.; Yang, K. Y.; Hong, S.

Nanoscience and Technology. PART 1. ed. Trans Tech Publications Ltd, 2007. p. 657-660 (Solid State Phenomena; Vol. 121-123, No. PART 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Lee, H, Yang, KY & Hong, S 2007, Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography. in Nanoscience and Technology. PART 1 edn, Solid State Phenomena, no. PART 1, vol. 121-123, Trans Tech Publications Ltd, pp. 657-660, China International Conference on Nanoscience and Technology, ChinaNANO 2005, Beijing, China, 05/6/9. https://doi.org/10.4028/www.scientific.net/ssp.121-123.657

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title = "Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography",

abstract = "In order to build a nano-device on polymer substrate, nano-size patterning must be done. However, conventional photolithography cannot be used to fabricate nano-sized patterns on polymer film due to the flexibility of polymer film and its potential interaction with developer solution and organic solvent. In this study, 100nm sized dense line and space patterns were made on flexible PET (polyethylene-terephthalate) substrate using newly developed monomer based imprinting lithography. Compared to hot embossing lithography, thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase and polymerization temperature is much lower than glass temperature of polymer, the nano-sized patterns can be transfer at much lower temperature and pressure. Hence, patterns as small as lOOnm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85°C and 5atm.",

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N2 - In order to build a nano-device on polymer substrate, nano-size patterning must be done. However, conventional photolithography cannot be used to fabricate nano-sized patterns on polymer film due to the flexibility of polymer film and its potential interaction with developer solution and organic solvent. In this study, 100nm sized dense line and space patterns were made on flexible PET (polyethylene-terephthalate) substrate using newly developed monomer based imprinting lithography. Compared to hot embossing lithography, thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase and polymerization temperature is much lower than glass temperature of polymer, the nano-sized patterns can be transfer at much lower temperature and pressure. Hence, patterns as small as lOOnm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85°C and 5atm.

AB - In order to build a nano-device on polymer substrate, nano-size patterning must be done. However, conventional photolithography cannot be used to fabricate nano-sized patterns on polymer film due to the flexibility of polymer film and its potential interaction with developer solution and organic solvent. In this study, 100nm sized dense line and space patterns were made on flexible PET (polyethylene-terephthalate) substrate using newly developed monomer based imprinting lithography. Compared to hot embossing lithography, thermal curing imprint lithography uses monomer based imprint resin which consists of base monomer and thermal initiator. Since it is liquid phase and polymerization temperature is much lower than glass temperature of polymer, the nano-sized patterns can be transfer at much lower temperature and pressure. Hence, patterns as small as lOOnm were successfully fabricated on flexible PET film substrate by monomer based thermal curing imprinting lithography at 85°C and 5atm.

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Fabrication of 100nm sized patterns on flexible Polyethylene-Terephthalate substrate using monomer based thermal curing nanoimprint lithography

Abstract

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Keywords

ASJC Scopus subject areas

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