Fabrication of 50 nm patterned nickel stamp with hot embossing and electroforming process

Sung Hoon Hong, Jong Hwa Lee, Heon Lee

Research output: Contribution to journalArticle

39 Citations (Scopus)

Abstract

Fabrication of imprint stamp is a key issue of nanoimprint lithography. In this study, we attempt to fabricate the nickel imprint stamp using hot embossing lithography and electroforming processes. As small as 50 nm sized patterns of original silicon master were faithfully transferred to polyvinyl chloride (PVC) film. By electroforming on hot embossed PVC film, nickel stamp, which has the same patterns of original silicon master stamp, was successfully fabricated.

Original languageEnglish
Pages (from-to)977-979
Number of pages3
JournalMicroelectronic Engineering
Volume84
Issue number5-8
DOIs
Publication statusPublished - 2007 May 1

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Keywords

  • Hot embossing
  • Nanoimprint lithography
  • Nickel stamp

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics

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