Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process

Hak Jong Choi, Sang Woo Ryu, Junho Jun, Sungjin Moon, Daihong Huh, Yang Doo Kim, Heon Lee

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77% of the transmittance of the PC film and a sheet resistance of 2-10 Ω sq-1. In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20000 cycles of bending tests.

Original languageEnglish
Pages (from-to)81814-81817
Number of pages4
JournalRSC Advances
Volume6
Issue number85
DOIs
Publication statusPublished - 2016

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polycarbonate
Polycarbonates
Electrodeposition
Fabrication
Sheet resistance
Hydrogen
Stainless Steel
Bending tests
Printing
Stainless steel
Electrodes
Substrates

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Chemistry(all)

Cite this

Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process. / Choi, Hak Jong; Ryu, Sang Woo; Jun, Junho; Moon, Sungjin; Huh, Daihong; Kim, Yang Doo; Lee, Heon.

In: RSC Advances, Vol. 6, No. 85, 2016, p. 81814-81817.

Research output: Contribution to journalArticle

Choi, Hak Jong ; Ryu, Sang Woo ; Jun, Junho ; Moon, Sungjin ; Huh, Daihong ; Kim, Yang Doo ; Lee, Heon. / Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process. In: RSC Advances. 2016 ; Vol. 6, No. 85. pp. 81814-81817.
@article{9c64461f004348209eb63e3d1bdc94d0,
title = "Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process",
abstract = "In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77{\%} of the transmittance of the PC film and a sheet resistance of 2-10 Ω sq-1. In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20000 cycles of bending tests.",
author = "Choi, {Hak Jong} and Ryu, {Sang Woo} and Junho Jun and Sungjin Moon and Daihong Huh and Kim, {Yang Doo} and Heon Lee",
year = "2016",
doi = "10.1039/c6ra14565e",
language = "English",
volume = "6",
pages = "81814--81817",
journal = "RSC Advances",
issn = "2046-2069",
publisher = "Royal Society of Chemistry",
number = "85",

}

TY - JOUR

T1 - Fabrication of a transparent conducting Ni-nanomesh-embedded film using template-assisted Ni electrodeposition and hot transfer process

AU - Choi, Hak Jong

AU - Ryu, Sang Woo

AU - Jun, Junho

AU - Moon, Sungjin

AU - Huh, Daihong

AU - Kim, Yang Doo

AU - Lee, Heon

PY - 2016

Y1 - 2016

N2 - In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77% of the transmittance of the PC film and a sheet resistance of 2-10 Ω sq-1. In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20000 cycles of bending tests.

AB - In the present work, we developed a new method for fabricating Ni nanomeshes for transparent conducting electrodes using template-assisted Ni electrodeposition and a hot transfer process. By employing the direct printing of hydrogen silsesquioxane (HSQ), the microscale HSQ template was successfully transferred onto a stainless steel substrate. The Ni nanomesh was fabricated using selective Ni electrodeposition and a hot transfer process on a polycarbonate (PC) film. The Ni-nanomesh-embedded PC film exhibited approximately 77% of the transmittance of the PC film and a sheet resistance of 2-10 Ω sq-1. In addition, the transmittance and sheet resistance of the Ni-nanomesh-embedded PC film were not significantly degraded after 20000 cycles of bending tests.

UR - http://www.scopus.com/inward/record.url?scp=84984823786&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84984823786&partnerID=8YFLogxK

U2 - 10.1039/c6ra14565e

DO - 10.1039/c6ra14565e

M3 - Article

AN - SCOPUS:84984823786

VL - 6

SP - 81814

EP - 81817

JO - RSC Advances

JF - RSC Advances

SN - 2046-2069

IS - 85

ER -