Fabrication of complex nanoscale structures on various substrates

Kang Soo Han, Sung Hoon Hong, Heon Lee

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Abstract

Polymer based complex nanoscale structures were fabricated and transferred to various substrates using reverse nanoimprint lithography. To facilitate the fabrication and transference of the large area of the nanostructured layer to the substrates, a water-soluble polyvinyl alcohol mold was used. After generation and transference of the nanostructured layer, the polyvinyl alcohol mold was removed by dissolving in water. A residue-free, UV-curable, glue layer was formulated and used to bond the nanostructured layer onto the substrates. As a result, nanometer scale patterned polymer layers were bonded to various substrates and three-dimensional nanostructures were also fabricated by stacking of the layers.

Original languageEnglish
Article number123118
JournalApplied Physics Letters
Volume91
Issue number12
DOIs
Publication statusPublished - 2007 Sep 28

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ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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