Fabrication of Fe3O4 thin film using reactive DC magnetron sputtering

Minkyung Jung, Sungmin Park, Daewon Park, Seong Rae Lee

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We investigated the effects of deposition conditions on the fabrication of Fe3O4 thin films using a reactive DC magnetron sputtering at room temperature. The structural, electrical, and magnetic properties of Fe oxide films dependence on the film thickness, oxygen flow rate, and the substrate crystallinity were also studied. We have successfully fabricated Fe3O4 film with thickness of about 10 nm under optimal reactive sputtering conditions. The saturation magnetization, resistivity, and Verwey transition of the Fe3O4 film were 298 emu/cc, 4.0× 10-2 Ωcm, and 125 K., respectively.

Original languageEnglish
Pages (from-to)378-382
Number of pages5
JournalJournal of Korean Institute of Metals and Materials
Volume47
Issue number6
Publication statusPublished - 2009 Jun

Keywords

  • FeO film
  • Half metallic reactive sputtering

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Modelling and Simulation
  • Surfaces, Coatings and Films
  • Metals and Alloys

Fingerprint Dive into the research topics of 'Fabrication of Fe<sub>3</sub>O<sub>4</sub> thin film using reactive DC magnetron sputtering'. Together they form a unique fingerprint.

  • Cite this