Fabrication of functional nanosized patterns with UV-curable polysilsesquioxane on photovoltaic protective glass substrates using hybrid nano-imprint lithography

Ju Hyeon Shin, Bit Na Go, Hak Jong Choi, Joong Yeon Cho, Albert Sung Soo Lee, Seung Sang Hwang, Hyuk Jin Cha, Heon Lee

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

UV-curable polysilsesquioxane materials were used to incorporate moth-eye structures on photovoltaic (PV) protective glass. These patterns were formed using a hybrid nanoimprint lithography technique and annealed at 100 °C to evaporate the solvent (xylene). Compared to the bare, un-patterned PV protective glass, the PV protective glass patterned on both sides had superior optical properties. Transmittance of the PV protective glass patterned on both sides increased by up to 3.13% and reflectance decreased by up to 3.42%, and the transmittance was increased for all angles of incidence. Furthermore, the J SC of devices with the PV protective glass patterned on both sides increased by up to 3.15%. Finally, a monitoring system was set up to measure electricity generated by PV modules. The efficiency of the PV module with PV protective glass patterned on both sides was enhanced by up to 12.16% compared with that of the PV module with un-patterned PV protective glass.

Original languageEnglish
Pages (from-to)5864-5869
Number of pages6
JournalJournal of Materials Chemistry C
Volume2
Issue number29
DOIs
Publication statusPublished - 2014 Aug 7

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Chemistry

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