Fabrication of GaN nanorods by inductively coupled plasma etching via SiO2 nanosphere lithography

Byung Jae Kim, Hyunjung Jung, Hong Yeol Kim, Joona Bang, Ji Hyun Kim

Research output: Contribution to journalArticle

29 Citations (Scopus)

Abstract

In this study, we present a facile route to fabricate GaN nanorods by employing the nanosphere lithography (NSL) technique. Compared to previous approaches, it was demonstrated that arrays of silica (SiO2) nanospheres can be effectively used as etching masks for the inductively coupled plasma etching process. By adjusting the etching conditions between SiO2 nanospheres and GaN substrates, well-defined nanorods, which were as long as a few microns with controllable diameters, were successfully fabricated. This method is much simpler than any other technique currently being used, and can be generally applied to fabricate various types of nanorods.

Original languageEnglish
Pages (from-to)3859-3861
Number of pages3
JournalThin Solid Films
Volume517
Issue number14
DOIs
Publication statusPublished - 2009 May 29

Fingerprint

Plasma etching
Nanospheres
Inductively coupled plasma
plasma etching
Nanorods
Lithography
nanorods
lithography
Fabrication
fabrication
Etching
etching
Silicon Dioxide
Masks
masks
adjusting
Silica
routes
silicon dioxide
Substrates

Keywords

  • GaN nanorods
  • Nanosphere lithography
  • Plasma etching
  • SiO particles

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Fabrication of GaN nanorods by inductively coupled plasma etching via SiO2 nanosphere lithography. / Kim, Byung Jae; Jung, Hyunjung; Kim, Hong Yeol; Bang, Joona; Kim, Ji Hyun.

In: Thin Solid Films, Vol. 517, No. 14, 29.05.2009, p. 3859-3861.

Research output: Contribution to journalArticle

Kim, Byung Jae ; Jung, Hyunjung ; Kim, Hong Yeol ; Bang, Joona ; Kim, Ji Hyun. / Fabrication of GaN nanorods by inductively coupled plasma etching via SiO2 nanosphere lithography. In: Thin Solid Films. 2009 ; Vol. 517, No. 14. pp. 3859-3861.
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