Fabrication of GaN nanorods by inductively coupled plasma etching via SiO₂ nanosphere lithography

Engineering & Materials Science

• Nanospheres 100%
• Inductively coupled plasma 89%
• Plasma etching 89%
• Nanorods 88%
• Lithography 65%
• Fabrication 44%
• Etching 42%
• Silica 20%
• Masks 18%
• Substrates 14%

Physics & Astronomy

• plasma etching 67%
• lithography 50%
• fabrication 36%
• etching 30%
• masks 16%
• routes 16%
• adjusting 16%
• silicon dioxide 15%

Chemical Compounds

• Inductively Coupled Plasma 59%
• Nanosphere 58%
• Etching 53%
• Nanorod 51%