The spin self-assembly (SA) process utilizing interactions which causes adsorption, the rearrangement of polymer chains onto a substrate, and the desorption of weakly bound chains in a very short time of approximately 10 s was demonstrated. This new ultrathin film-forming process yields a highly ordered internal structure far superior to the structure obtained with the dip SA process. In addition, it allows to predict and control precisely the bilayer thickness as well as the surface roughness.
|Number of pages||3|
|Publication status||Published - 2001 Jul 18|
ASJC Scopus subject areas
- Materials Science(all)