Abstract
Hollow-type microneedle array can be used for painless, continuous and stable drug delivery through a human skin. The needles must be sharp and have sufficient length in order to penetrate the epidermis. An array of hollow-type silicon microneedles was fabricated by using deep reactive ion etching and HNA wet etching with two oxide masks. Isotropic etching was used to create tapered tips of the needles, and anisotropic etching of Bosch process was used to make the extended length and holes of microneedles. The microneedles were formed by three steps of isotropic, anisotropic, and isotropic etching in order. The holes were made by one anisotropic etching step. The fabricated microneedles have 170 μm width, 40 μm hole diameter and 230 μm length.
| Original language | English |
|---|---|
| Pages (from-to) | 2221-2224 |
| Number of pages | 4 |
| Journal | Transactions of the Korean Institute of Electrical Engineers |
| Volume | 56 |
| Issue number | 12 |
| Publication status | Published - 2007 Dec 1 |
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Keywords
- Anisotropic etching
- Deep reactive ion etching
- HNA wet etching
- Hollow-type silicon micronedle array
- Isotropic etching
ASJC Scopus subject areas
- Electrical and Electronic Engineering
Cite this
Fabrication of Hollow-type Silicon Microneedle Array Using Microfabrication Technology. / Kim, Seung Kook; Chang, Jong Hyeon; Kim, Byoungmin; Yang, Sang Sik; Hwang, In Sik; Pak, James Jungho.
In: Transactions of the Korean Institute of Electrical Engineers, Vol. 56, No. 12, 01.12.2007, p. 2221-2224.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Fabrication of Hollow-type Silicon Microneedle Array Using Microfabrication Technology
AU - Kim, Seung Kook
AU - Chang, Jong Hyeon
AU - Kim, Byoungmin
AU - Yang, Sang Sik
AU - Hwang, In Sik
AU - Pak, James Jungho
PY - 2007/12/1
Y1 - 2007/12/1
N2 - Hollow-type microneedle array can be used for painless, continuous and stable drug delivery through a human skin. The needles must be sharp and have sufficient length in order to penetrate the epidermis. An array of hollow-type silicon microneedles was fabricated by using deep reactive ion etching and HNA wet etching with two oxide masks. Isotropic etching was used to create tapered tips of the needles, and anisotropic etching of Bosch process was used to make the extended length and holes of microneedles. The microneedles were formed by three steps of isotropic, anisotropic, and isotropic etching in order. The holes were made by one anisotropic etching step. The fabricated microneedles have 170 μm width, 40 μm hole diameter and 230 μm length.
AB - Hollow-type microneedle array can be used for painless, continuous and stable drug delivery through a human skin. The needles must be sharp and have sufficient length in order to penetrate the epidermis. An array of hollow-type silicon microneedles was fabricated by using deep reactive ion etching and HNA wet etching with two oxide masks. Isotropic etching was used to create tapered tips of the needles, and anisotropic etching of Bosch process was used to make the extended length and holes of microneedles. The microneedles were formed by three steps of isotropic, anisotropic, and isotropic etching in order. The holes were made by one anisotropic etching step. The fabricated microneedles have 170 μm width, 40 μm hole diameter and 230 μm length.
KW - Anisotropic etching
KW - Deep reactive ion etching
KW - HNA wet etching
KW - Hollow-type silicon micronedle array
KW - Isotropic etching
UR - http://www.scopus.com/inward/record.url?scp=37249073032&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=37249073032&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:37249073032
VL - 56
SP - 2221
EP - 2224
JO - Transactions of the Korean Institute of Electrical Engineers
JF - Transactions of the Korean Institute of Electrical Engineers
SN - 1975-8359
IS - 12
ER -